Patents by Inventor Brett Christian Hoogensen

Brett Christian Hoogensen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated apparatus for efficient removal of halogen residues from etched substrates
    Patent number: 9735002
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: August 15, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim
  • Integrated method and apparatus for efficient removal of halogen residues from etched substrates
    Patent number: 7655571
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: February 2, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven M. Kim
  • INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES
    Publication number: 20090014324
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Application
    Filed: August 29, 2008
    Publication date: January 15, 2009
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim
  • INTEGRATED METHOD AND APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES
    Publication number: 20080102646
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Application
    Filed: October 26, 2006
    Publication date: May 1, 2008
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim