Abstract: An irrigating bipolar forceps may include a first forceps arm, a conductor tip of the first forceps arm, a second forceps arm, a conductor tip of the second forceps arm, an input conductor isolation mechanism, and irrigation tubing. A proximal end of the first forceps arm may be disposed within the input conductor isolation mechanism and a proximal end of the second forceps arm may be disposed within the input conductor isolation mechanism. An application of a force to a lateral portion of the forceps arms may be configured to close the forceps arms. A reduction of a force applied to a lateral portion of the forceps arms may be configured to open the forceps arms. The irrigation tubing may transport a fluid from an irrigation supply system to a surgical site.

Abstract: An irrigating bipolar forceps may include a first forceps arm, a conductor tip of the first forceps arm, a second forceps arm, a conductor tip of the second forceps arm, an input conductor isolation mechanism, and irrigation tubing. A proximal end of the first forceps arm may be disposed within the input conductor isolation mechanism and a proximal end of the second forceps arm may be disposed within the input conductor isolation mechanism. An application of a force to a lateral portion of the forceps arms may be configured to close the forceps arms. A reduction of a force applied to a lateral portion of the forceps arms may be configured to open the forceps arms. The irrigation tubing may transport a fluid from an irrigation supply system to a surgical site.

Abstract: A temperature monitoring bipolar forceps may include a first forceps arm and a second forceps arm. The first forceps arm may include a first channel, a first conductor tip, and a first thermocouple housing. The second forceps arm may include a second channel, a second conductor tip, and a second thermocouple housing. A first thermocouple wire may include a first thermocouple and a second thermocouple wire may include a second thermocouple. The first thermocouple wire may be disposed in the first channel wherein the first thermocouple is disposed in the first thermocouple housing. The second thermocouple wire may be disposed in the second channel wherein the second thermocouple is disposed in the second thermocouple housing. The first thermocouple may be configured to measure a temperature of the first conductor tip and the second thermocouple may be configured to measure a temperature of the second conductor tip.

Abstract: A bipolar forceps with active cooling may include a first forceps arm having a first forceps arm distal end and a first forceps arm proximal end, a second forceps arm having a second forceps arm distal end and a second forceps arm proximal end, a coolant multiplexer, a coolant transfer tube, and a coolant transfer machine interface. The coolant transfer machine interface may be configured to interface with a coolant transfer machine to circulate a coolant through an internal conduit of the first forceps arm and an internal conduit of the second forceps arm. Circulating the coolant through the internal conduit of the first forceps arm may be configured to decrease a temperature of a conductor tip of the first forceps arm. Circulating the coolant through the internal conduit of the second forceps arm may be configured to decrease a temperature of a conductor tip of the second forceps arm.

Abstract: An irrigating bipolar forceps may include a first forceps arm, a conductor tip of the first forceps arm, a second forceps arm, a conductor tip of the second forceps arm, an input conductor isolation mechanism, and irrigation tubing. A proximal end of the first forceps arm may be disposed within the input conductor isolation mechanism and a proximal end of the second forceps arm may be disposed within the input conductor isolation mechanism. An application of a force to a lateral portion of the forceps arms may be configured to close the forceps arms. A reduction of a force applied to a lateral portion of the forceps arms may be configured to open the forceps arms. The irrigation tubing may transport a fluid from an irrigation supply system to a surgical site.

Abstract: A bipolar forceps may include a first forceps arm having a first forceps arm aperture, a first forceps jaw, and a first forceps arm conductor tip; a second forceps arm having a second forceps arm aperture, a second forceps jaw, and a second forceps arm conductor tip; and an input conductor isolation mechanism having a first forceps arm housing and a second forceps arm housing. The first forceps arm conductor tip may be configured to conduct current only at a medial portion of the first forceps arm. Illustratively, the second forceps arm conductor tip may be configured to conduct current only at a medial portion of the second forceps arm.

Abstract: An irrigating bipolar forceps may include a first forceps arm, a conductor tip of the first forceps arm, a second forceps arm, a conductor tip of the second forceps arm, an input conductor isolation mechanism, and irrigation tubing. A proximal end of the first forceps arm may be disposed within the input conductor isolation mechanism and a proximal end of the second forceps arm may be disposed within the input conductor isolation mechanism. An application of a force to a lateral portion of the forceps arms may be configured to close the forceps arms. A reduction of a force applied to a lateral portion of the forceps arms may be configured to open the forceps arms. The irrigation tubing may transport a fluid from an irrigation supply system to a surgical site.

Abstract: A bipolar forceps may include a first forceps arm having a first forceps arm aperture, a first forceps jaw, and a first forceps arm conductor tip; a second forceps arm having a second forceps arm aperture, a second forceps jaw, and a second forceps arm conductor tip; and an input conductor isolation mechanism having a first forceps arm housing and a second forceps arm housing. The first forceps arm conductor tip may be configured to conduct current only at a medial portion of the first forceps arm. Illustratively, the second forceps arm conductor tip may be configured to conduct current only at a medial portion of the second forceps arm.

Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.

Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.

Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

Abstract: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors is provided.

Abstract: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

Abstract: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated resonant power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

Abstract: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.