Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.

Abstract: A processing machine (10) for building a part (11) includes: a support device (26) including a support surface (26B); a drive device (28) which moves the support device (26) so as a specific position on the support surface (26B) is moved along a moving direction (25); a powder supply device (18) which supplies a powder (12) to the moving support device (26) to form a powder layer (13); an irradiation device (22) which irradiates at least a portion of the powder layer (13) with an energy beam (22D) to form at least a portion of the part (11) from the powder layer (13) during a first period of time; and a measurement device (20) which measures at least portion of the part (11) during a second period of time. The first period in which the irradiation device (22) irradiates the powder layer (13) with the energy beam (22D) and the second period in which the measurement device (22) measures are overlapped.

Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.