Abstract: Instrument control and data acquisition in advanced analytic systems that utilize optical pulses for sample analysis are described. Clocking signals for data acquisition, data processing, communication, and/or other data handling functionalities can be derived from an on-board pulsed optical source, such as a passively mode-locked laser. The derived clocking signals can operate in combination with one or more clocking signals from a stable oscillator, so that instrument operation and data handling can tolerate interruptions in operation of the pulsed optical source.

Abstract: A method for removing lead-210 (210Pb) from a metal, the method comprising determining a 210Pb concentration in a metal to be refined; determining an amount of low alpha lead to be added to the metal to be refined from the 210Pb concentration, the low alpha lead having a 210Pb concentration below that of the metal to be refined; forming a doped metal mixture by adding the low alpha lead to the metal to be refined; refining the doped metal mixture to separate at least a portion of the lead in the doped metal mixture to form a refined metal having a 210Pb concentration lower than that of the metal to be refined.

Abstract: The invention includes solder materials having low concentrations of alpha particle emitters, and includes methods of purification of materials to reduce a concentration of alpha particle emitters within the materials. The invention includes methods of reducing alpha particle flux in various lead-containing and lead-free materials through purification of the materials. The invention also includes methods of estimating the fractionation of a low concentration of one or more alpha particle emitters during purification of a material.

Abstract: A method for removing lead-210 (210Pb) from a metal, the method comprising determining a 210Pb concentration in a metal to be refined; determining an amount of low alpha lead to be added to the metal to be refined from the 210Pb concentration, the low alpha lead having a 210Pb concentration below that of the metal to be refined; forming a doped metal mixture by adding the low alpha lead to the metal to be refined; refining the doped metal mixture to separate at least a portion of the lead in the doped metal mixture to form a refined metal having a 210Pb concentration lower than that of the metal to be refined.

Abstract: An apparatus and an analytical method for detecting and measuring alpha particle emissions from liquid samples using direct detectors. The apparatus may include a partition that is vapor-impermeable and alpha-permeable such that vapor from the liquid sample is substantially or entirely prevented from escaping through the partition, while alpha particles are able to escape through the partition for detection. The method may offer improved accuracy, flexibility, and quality in detecting and measuring alpha particle emissions.

Abstract: A method for assessing an alpha particle emission potential of a metallic material. A metallic material is initially subjected to a secular equilibrium disruption process, such as melting and/or refining, to disrupt the secular equilibrium of the radioactive decay of one or more target parent isotopes in the material. A sample of the material is treated to diffuse target decay isotopes within the sample such that the measured alpha particle emission directly corresponds to the concentration or number of target decay isotope atoms within the entirety of the sample, enabling the concentration of target decay isotopes in the sample to be determined. The concentration of target parent isotopes in the material may then be determined from the concentration of target decay isotopes and time elapsed from the secular equilibrium disruption process, and may be used to determine a maximum alpha particle emission that the metallic material will exhibit.

Abstract: A method for assessing an alpha particle emission potential of a metallic material. A metallic material is initially subjected to a secular equilibrium disruption process, such as melting and/or refining, to disrupt the secular equilibrium of the radioactive decay of one or more target parent isotopes in the material. A sample of the material is treated to diffuse target decay isotopes within the sample such that the measured alpha particle emission directly corresponds to the concentration or number of target decay isotope atoms within the entirety of the sample, enabling the concentration of target decay isotopes in the sample to be determined. The concentration of target parent isotopes in the material may then be determined from the concentration of target decay isotopes and time elapsed from the secular equilibrium disruption process, and may be used to determine a maximum alpha particle emission that the metallic material will exhibit.

Abstract: A method for assessing an alpha particle emission potential of a metallic material. A metallic material is initially subjected to a secular equilibrium disruption process, such as melting and/or refining, to disrupt the secular equilibrium of the radioactive decay of one or more target parent isotopes in the material. A sample of the material is treated to diffuse target decay isotopes within the sample such that the measured alpha particle emission directly corresponds to the concentration or number of target decay isotope atoms within the entirety of the sample, enabling the concentration of target decay isotopes in the sample to be determined. The concentration of target parent isotopes in the material may then be determined from the concentration of target decay isotopes and time elapsed from the secular equilibrium disruption process, and may be used to determine a maximum alpha particle emission that the metallic material will exhibit.

Abstract: An electrorefining process is disclosed for producing high purity tin having reduced short-term and long-term alpha particle emissions and reduced lead levels. The process may use a mixed acidic electrolytic solution including at least a first electrolyte that provides sulfate ions in the mixed electrolytic solution, such as sulfuric acid, and a second electrolyte that provides halide ions in the mixed electrolytic solution, such as hydrochloric acid.

Abstract: A method for purifying tin includes exposing an electrolytic solution comprising tin to an ion exchange resin and depositing electrorefined tin from the electrolytic solution. The deposited electrorefined tin has alpha particle emissions of less than about 0.01 counts/hour/cm2 immediately after the deposition step, and an alpha emissivity of less than about 0.01 counts/hour/cm2 at least 90 days after the deposition step.

Abstract: A method for assessing an alpha particle emission potential of a metallic material. A metallic material is initially subjected to a secular equilibrium disruption process, such as melting and/or refining, to disrupt the secular equilibrium of the radioactive decay of one or more target parent isotopes in the material. A sample of the material is treated to diffuse target decay isotopes within the sample such that the measured alpha particle emission directly corresponds to the concentration or number of target decay isotope atoms within the entirety of the sample, enabling the concentration of target decay isotopes in the sample to be determined. The concentration of target parent isotopes in the material may then be determined from the concentration of target decay isotopes and time elapsed from the secular equilibrium disruption process, and may be used to determine a maximum alpha particle emission that the metallic material will exhibit.

Abstract: The invention includes a method of detecting impurities in a metal-containing article. A portion of metal material is removed from a metal article and is solubilized in an acid or base-comprising liquid to produce a liquid sample. The liquid sample is subjected to an incident laser beam and light scattered from the sample is detected. The invention includes a method of analyzing a physical vapor deposition target material. A portion of target material is removed from the target and is rinsed with an acid-comprising solution. The portion of target material is dissolved to produce a liquid sample. The sample is subjected to an incident laser beam and scatter of the laser beam is detected to determine the number of particles present in the sample within a particular size range.

Abstract: The invention includes solder materials having low concentrations of alpha particle emitters, and includes methods of purification of materials to reduce a concentration of alpha particle emitters within the materials. The invention includes methods of reducing alpha particle flux in various lead-containing and lead-free materials through purification of the materials. The invention also includes methods of estimating the fractionation of a low concentration of one or more alpha particle emitters during purification of a material.

Abstract: The invention includes solder materials having low concentrations of alpha particle emitters, and includes methods of purification of materials to reduce a concentration of alpha particle emitters within the materials. The invention includes methods of reducing alpha particle flux in various lead-containing and lead-free materials through purification of the materials. The invention also includes methods of estimating the fractionation of a low concentration of one or more alpha particle emitters during purification of a material.

Abstract: The Invention includes target/backing plate constructions and methods of forming target/backing plate constructions. The targets and backing plates can be bonded to one another through an appropriate interlayer. The targets can comprise one or more of aluminum, copper, tantalum and titanium. The interlayer can comprise one or more of silver, copper, nickel, tin, titanium and indium. Target/backing plate constructions of the present invention can have bond strengths of at least 20 ksi and an average grain size within the target of less than 80 microns.

Abstract: The invention includes solder materials having low concentrations of alpha particle emitters, and includes methods of purification of materials to reduce a concentration of alpha particle emitters within the materials. The invention includes methods of reducing alpha particle flux in various lead-containing and lead-free materials through purification of the materials. The invention also includes methods of estimating the fractionation of a low concentration of one or more alpha particle emitters during purification of a material.