Abstract: A system is provided for fenestration within a body lumen. The system includes an intraluminal device and a processor. The processor is configured to, from an imaging system, obtain a planning image including the lumen and a branch lumen extending from the lumen, and, in the planning image: identify a treatment device; identify a centerline of the branch lumen extending from the branch lumen to a desired puncture point on the treatment device; and identify a desired trajectory of the intraluminal device relative to the puncture point. The processor is also configured to, from a second imaging system, obtain a live procedural image including the lumen and the branch lumen; and in the live procedural image, identify the treatment device, the centerline of the branch lumen, the desired puncture point, the desired trajectory of the intraluminal device, and the actual trajectory of the intraluminal device.

Abstract: The present invention relates to medical guidance. In order to provide a facilitated way of providing improved images about a current situation, a device (10) for guidance during medical procedures is provided. The device comprises a data input (12), a data processor (14) and an output interface (16). The data input is configured to provide 3D image data of a region of interest of a subject and to provide current 2D image data of the region of interest. The data processor is configured to register the current 2D image data with the 3D image data to determine a first transformation, to identify non-linear and linear components of the determined first transformation, to apply the identified linear components of the first transformation to the 3D image data and to generate a projection image from the 3D image data with the linear components applied to the 3D image data. The output interface is configured to provide the projection image as guidance during a medical procedure.

Abstract: For enhanced resistance to electromigration failure, a thin metal film interconnect on an integrated circuit chip should use multiple parallel minimum-width lines when the minimum linewidth is less than one and one-half times the mean grain size of the metal film. When the interconnect is longer than a certain predetermined length, then the multiple lines of the interconnect should have intermediate interconnections or bridges between neighboring ones of the multiple lines. When the interconnect is many times longer than the predetermined length, then the bridges define slots between the neighboring lines, and the slots should have a length of about the predetermined length. When the interconnect is many times longer than the predetermined length and the interconnect has more than two parallel lines, then the slots on one side of a parallel line should be staggered or offset with respect to the slots on the other side of the parallel line.

Abstract: For fine line lithography of a reflective substrate, a layer of titanium nitride is applied between the reflective surface and the photoresist that is absorbant at the wavelength of light used to expose the photoresist. The resolution of the photoresist is improved, even when an absorbant dye is used in the photoresist. The titanium nitride can be readily removed at the same time as the reflective layer is patterned, thereby avoiding the need of a separate step to remove the absober layer during etching of the reflective substrate.