Patents by Inventor Brian C. O'Connell
Brian C. O'Connell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240212168Abstract: Embodiments relate to a detection system. The detection system includes a light detection and ranging (LIDAR) module configured to scan a swarm of objects to generate image data of a first object associated with a swarm. The detection system includes an image processing module configured to process the image data and control the at least one LIDAR module. The image processing module is configured to: detect presence of a first object; detect a feature of a first object for which the presence has been detected; characterize, using image processing, a feature of a first object; and initiate, based on the characterization of a feature, the LIDAR module to any one or combination of track a first object for which the presence has been detected or scan a swarm to generate image data of a second object associated with a swarm.Type: ApplicationFiled: December 15, 2023Publication date: June 27, 2024Applicant: Booz Allen Hamilton Inc.Inventors: John Alvin Carl, III, Michael Stinger, Kevin Uher, Brian C. O'Connor
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Patent number: 7904962Abstract: Disclosed is a system for modeling, analyzing, and responding to network attacks. Machines are mapped to components, components are mapped to vulnerabilities, and vulnerabilities are mapped to exploits. Each of the exploits includes at least one precondition mapped to at least one postcondition. An attack graph which defines inter-exploit distances is generated using at least one of the exploits. The attack graph is aggregated. At least one hardening option is determined using the aggregated attack graph. Hardening options include applying at least one corrective measure to at least one initial condition, where the initial condition is the initial state of a precondition.Type: GrantFiled: March 10, 2006Date of Patent: March 8, 2011Assignee: George Mason Intellectual Properties, Inc.Inventors: Sushil Jajodia, Steven E. Noel, Pramod Kalapa, Brian C. O'Berry, Michael A. Jacobs, Eric B. Robertson, Robert G. Weierbach
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Patent number: 7555778Abstract: Disclosed is a network hardening mechanism. The mechanism: generates a dependency graph from a multitude of exploits; constructs a goal conditions expression which may then be used to determine set(s) of safe network configurations. A subset of these safe network configuration sets may then be selected for implementation using hardening costs as a criterion.Type: GrantFiled: October 17, 2005Date of Patent: June 30, 2009Assignee: George Mason Intellectual Properties, Inc.Inventors: Steven E. Noel, Sushil Jajodia, Brian C. O'Berry, Michael A. Jacobs
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Patent number: 7226779Abstract: An adenoviral vector is disclosed that includes two adenoviral ITRs, wherein the two adenoviral ITRs flank a packaging signal and a single retroviral LTR operably linked to a nucleic acid sequence of interest, wherein the adenoviral vector does not include a nucleic acid sequence encoding the retroviral structural proteins and wherein the adenoviral vector does not include a second retroviral LTR. In one embodiment, a method for transforming a cell is disclosed. In another embodiment, a method is disclosed for introducing a transgene into a cell with a single viral vector. In a further embodiment, a method is provided for preventing or treating disorder in a subject. A pharmaceutical composition is also provided.Type: GrantFiled: January 25, 2002Date of Patent: June 5, 2007Assignee: The United States of America as represented by the Department of Health and Human ServicesInventors: Changyu Zheng, Bruce J. Baum, Brian C. O'Connell
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Patent number: 4807480Abstract: Powder mass flow rates are measured by constraining the powder to flow within an apparatus which injects a charge into the powder at a first position and measures at a plurality of positions downstream from the first position the charge remaining in the powder and means for calculating from the injected and remaining charge the powder mass flow.Type: GrantFiled: August 5, 1986Date of Patent: February 28, 1989Assignee: National Research Development CorporationInventors: Brian C. O'Neill, Christopher A. Willis
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Patent number: 4642438Abstract: A high precision, high throughput submicrometer workpiece positioning system, particularly useful as a workpiece positioning means in electron beam lithography tools. The positioning system increases mechanical stability by essentially eliminating mechanical hysteresis, which allows state of the art electron beam lithography systems to provide the repeatable, accurate and dense circuit patterns that modern semiconductor trends demand.The positioning system in preferred form comprises a movable positioning table, a workpiece supporting superstructure which is elastically joined to the movable positioning table by three geometrically distinct kinematic support means and a two-stage coupling means which mounts a workpiece (i.e., semiconductor mask or wafer) to the workpiece supporting superstructure. A laser interferometer locating-positioning system is utilized to position the workpiece. The interferometer mirrors are integral with the workpiece supporting superstructure.Type: GrantFiled: November 19, 1984Date of Patent: February 10, 1987Assignee: International Business Machines CorporationInventors: Karl W. Beumer, Charles A. Gaston, Charles H. Locke, Alfred Mack, Brian C. O'Neill, Warren J. Pinckney, Alan D. Wilson
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Patent number: 4516799Abstract: A snow removal implement includes a polygonal main body having a scraping edge at one end and a hand gripping means adjacent an opposite end with a foot engageable means intermediate opposite ends so that the operator can be in a generally upright position and use leg power rather than back muscles for manipulation.Type: GrantFiled: March 15, 1984Date of Patent: May 14, 1985Inventor: Brian C. O'Donnell
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Patent number: 4382739Abstract: An elevator drive shaft is air pressure counter-balanced and dampened under varying load and system pressure conditions by applying required air pressure to an appropriate side of a piston moving with the drive shaft in an electron beam semiconductor wafer writing apparatus vacuum chamber. Air pressure counterbalancing load forces minimize the actuating forces required to drive the elevator, substantially minimizing vibratory shock and distortion to the electron beam writing system and increasing speed of wafer movement. This permits electron beam writing on one wafer simultaneously with a load/unload operation of a second semiconductor wafer. The counter-balancing load forces also minimize the probability of accidental damage to the system or semiconductor wafers due to uncontrolled high forces or upon mechanical impact between moving and fixed parts, during apparatus malfunction.Type: GrantFiled: December 24, 1980Date of Patent: May 10, 1983Assignee: International Business Machines CorporationInventors: Alfred Mack, Brian C. O'Neill
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Patent number: 4355937Abstract: An electron beam vacuum chamber is provided with an elevator mechanism within the chamber including a platform closing off an opening within a horizontal vacuum chamber wall and separating the vacuum chamber from an overlying antechamber partially defined by a vertically displaceable lid overlying the opening and moving towards and away from the opening. Resilient peripheral seals are fixed to the lid facing the chamber wall and the elevator platform. A coil spring partially compressible upon contact with the first peripheral seal carried by the lid with the face of the vacuum chamber wall forms a first mechanical override and an annular spring metal diaphragm fixedly mounted about its outer peripheral edge to the vacuum chamber adjacent the opening has its inner peripheral edge freely flexible and is contacted by the resilient peripheral seal of the platform to form a second mechanical override.Type: GrantFiled: December 24, 1980Date of Patent: October 26, 1982Assignee: International Business Machines CorporationInventors: Alfred Mack, Brian C. O'Neill, Fred L. Penzetta
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Patent number: 4342090Abstract: A batch chip placement system for batch positioning semiconductor chips, or the like, upon a substrate containing an array of chip sites or footprints whose actual position on the substrate deviates from the theoretical or nominal position over successive substrates. The positioning is achieved by first sensing the X and Y offsets of a pair of alignment marks on the substrate from their theoretical or nominal position to determine the .DELTA.X and .DELTA.Y correction factors required to obtain the actual X,Y position of the alignment marks. The actual X,Y position of the alignment marks is used to determine actual X,Y chip position values, .theta. rotation and shrinkage factor corrections required to obtain proper orientation and positioning for batch chip placement.Type: GrantFiled: June 27, 1980Date of Patent: July 27, 1982Assignee: International Business Machines Corp.Inventors: George A. Caccoma, Joseph H. Koestner, Brian C. O'Neill, Frank M. Tappen