Patents by Inventor Brian D. Crevasse

Brian D. Crevasse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for photoresist rework to avoid sodium incorporation
    Patent number: 6218085
    Abstract: A method for stripping photoresist material (26) from a semiconductor substrate (16) avoids incorporation of sodium and other contaminant ions from a rework solvent. An oxygen and hydrogen plasma mixture strips the photoresist material without significant introduction of oxygen into the titanium nitride layer (24). Any oxidation of the titanium nitride is reversed by exposing the substrate to an oxygen-free, reducing plasma, such as a hydrogen-containing plasma. The titanium nitride layer is thereby much less susceptible to incorporation of contaminant ions in a subsequent cleaning with rework solvent than a layer which has been extensively oxidized during the plasma stripping process.
    Type: Grant
    Filed: September 21, 1999
    Date of Patent: April 17, 2001
    Assignee: Lucent Technologies Inc.
    Inventors: Simon J. Molloy, Nace Layadi, Allen Yen, Brian D. Crevasse, Steven A. Lytle