Abstract: The invention is directed to polished glass substrates suitable for extreme ultraviolet lithography. The elements are silica-titania glass elements having a coefficient of thermal expansion of 0±30×10?9/° C. or less, and containing 5-10 wt. % titania. The polished elements have a mid-spatial frequency peak-to-valley roughness of <10 nm and a high-spatial frequency roughness of <0.20 nm average roughness. The invention is further directed to a method of for producing optical elements suitable for extreme ultraviolet lithography (“EUVL”), the method having at least the steps of providing a glass substrate in the shape of the desired optical element and polishing the shaped substrate using a high abrasive slurry flow rate of >2.0 ml/cm2/min. Generally the flow rates are in the range of 2.0-10 ml/cm2/min. Glass substrates suitable for extreme ultraviolet lithography element have a coefficient of thermal expansion of 0±30×10?9/° C. or less.