Patents by Inventor Brian E. Cron

Brian E. Cron has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing
    Patent number: 7037178
    Abstract: The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: May 2, 2006
    Assignee: Micron Technology, Inc.
    Inventor: Brian E. Cron
  • Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing
    Patent number: 6994612
    Abstract: The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: February 7, 2006
    Assignee: Micron Technology, Inc.
    Inventor: Brian E. Cron
  • Apparatuses for conditioning surfaces of polishing pads
    Patent number: 6902470
    Abstract: The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: June 7, 2005
    Assignee: Micron Technology, Inc.
    Inventor: Brian E. Cron
  • Apparatuses for conditioning surfaces of polishing pads
    Publication number: 20040110451
    Abstract: The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
    Type: Application
    Filed: November 10, 2003
    Publication date: June 10, 2004
    Inventor: Brian E. Cron
  • Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing, and apparatuses for conditioning surfaces of polishing pads
    Publication number: 20040097176
    Abstract: The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
    Type: Application
    Filed: November 10, 2003
    Publication date: May 20, 2004
    Inventor: Brian E. Cron
  • Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing, and apparatuses for conditioning surfaces of polishing pads
    Publication number: 20030153252
    Abstract: The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
    Type: Application
    Filed: February 13, 2002
    Publication date: August 14, 2003
    Inventor: Brian E. Cron