Patents by Inventor Brian G. Lu

Brian G. Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200030139
    Abstract: The present invention provides improved devices for removing energy and fluid from body fluid containing spaces and surfaces of a mammal, the devices including isolated air and water delivery systems configured to simultaneously deliver streams of dry air and liquid water to the nostrils of a patient, without allowing the streams to come into contact with one-another until it enters the patient's nostrils.
    Type: Application
    Filed: July 27, 2018
    Publication date: January 30, 2020
    Inventors: William G. DeMore, JR., James A. Kendall, Benjamin R. Lane, Chester B. Larrow, Kun Li, Brian L. Lipford, Owen J. Lu, Joshua M. Mull, Aaron S. Pearl
  • Patent number: 7482247
    Abstract: Conformal nanolaminate dielectric deposition and etch back processes that can fill high aspect ratio (typically at least 5:1, for example 6:1), narrow width (typically sub 0.13 micron, for example 0.1 micron or less) gaps with significantly reduced incidence of voids or weak spots involve the use of any suitable confirmal dielectric deposition technique and a dry etch back. The etch back part of the process involves a single step or an integrated multi-step (for example, two-step) procedure including an anisotropic dry etch followed by an isotropic dry etch. The all dry deposition and etch back process in a single tool increases throughput and reduces handling of wafers resulting in more efficient and higher quality nanolaminate dielectric gap fill operations.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: January 27, 2009
    Assignee: Novellus Systems, Inc.
    Inventors: George D. Papasouliotis, Raihan M. Tarafdar, Ron Rulkins, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton, Bunsen Nie, Wai-Fan Yau, Brian G. Lu, Timothy M. Archer, Sasson Roger Somekh
  • Patent number: 7265061
    Abstract: Methods and apparatus for preparing a porous low-k dielectric material on a substrate are provided. The methods optionally involve the use of ultraviolet radiation to react with and remove porogen from a porogen containing precursor film leaving a porous dielectric matrix and further exposing the dielectric matrix to ultraviolet radiation to increase the mechanical strength of the dielectric matrix. Some methods involve activating a gas to create reactive gas species that can clean a reaction chamber. One disclosed apparatus includes an array of multiple ultraviolet sources that can be controlled such that different wavelengths of light can be used to irradiate a sample at a time.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: September 4, 2007
    Assignee: Novellus Systems, Inc.
    Inventors: Seon-Mee Cho, Easwar Srinivasan, Brian G. Lu, David Mordo
  • Patent number: 7208389
    Abstract: Methods of preparing a porous low-k dielectric material on a substrate are provided. The methods involve the use of ultraviolet radiation to react with and remove porogen from a porogen containing precursor film, leaving a porous low-k dielectric matrix. Methods using oxidative conditions and non-oxidative conditions are described. The methods described may be used to remove porogen from porogen-containing precursor films. The porogen may be a hydrocarbon such as a terpene (e.g., alpha-terpinene) or a norbornene (e.g., ENB). The resulting porous low-k dielectric matrix can then be annealed to remove water and remaining silanols capped to protect it from degradation by ambient conditions, which methods will also be described.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: April 24, 2007
    Assignee: Novellus Systems, Inc.
    Inventors: Adrianne K. Tipton, Brian G. Lu, Patrick A. Van Cleemput, Michelle T. Schulberg, Qingguo Wu, Haiying Fu, Feng Wang