Patents by Inventor Brian J. Collister

Brian J. Collister has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090246689
    Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat.
    Type: Application
    Filed: June 11, 2009
    Publication date: October 1, 2009
    Inventors: Yisong Yu, Brian J. Collister, Jonathan W. Goodin, Graham Darling, Jacqueline L. Ricafrente, Susan A. Wilklnson
  • Patent number: 7579133
    Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: August 25, 2009
    Assignee: Kodak Graphic Communications Canada Company
    Inventors: Yisong Yu, Brian J. Collister, Jonathan W. Goodin, Graham Darling, Jacqueline L. Ricafrente, Susan A. Wilkinson
  • Patent number: 7323288
    Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. Th radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor.
    Type: Grant
    Filed: August 25, 2003
    Date of Patent: January 29, 2008
    Assignee: Kodak Graphic Communications Canada Company
    Inventors: Yisong Yu, Brian J. Collister, Jonathan W. Goodin, Graham Darling, Jacqueline L. Ricafrente
  • Publication number: 20040202962
    Abstract: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. Th radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor.
    Type: Application
    Filed: August 25, 2003
    Publication date: October 14, 2004
    Inventors: Yisong Yu, Brian J. Collister, Jonathan W. Goodin, Graham Darling, Jacqueline L. Ricafrente
  • Publication number: 20040038152
    Abstract: An inkjet method is used to make a negative working offset lithographic printing master by imagewise application of liquid inkjet droplets that form a mask on a layer of positive-working radiation imageable material pre-coated on a hydrophilic lithographic base. The masked layer is then subjected to a developer and developed. After development, only the masked areas of the positive working imageable material remain. Since this material is hydrophobic the resulting imaged layer on the hydrophilic lithographic base may be employed as a wet offset lithographic master. Since the image that is printed by the printing master coincides directly with the image printed by the inkjetting process on the imageable material, the method is inherently negative-working. By the method of the present invention positive-working radiation imageable media is therefore employed to make a negative-working printing master.
    Type: Application
    Filed: July 10, 2003
    Publication date: February 26, 2004
    Inventors: Jonathan W. Goodin, Brian J. Collister