Patents by Inventor Brian L. WEHRENBERG

Brian L. WEHRENBERG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BLOCK CO-POLYMER PHOTORESIST
    Publication number: 20150380239
    Abstract: An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer. The block copolymer has two blocks A and B that do not self-assemble under at least some annealing conditions. The exposed block copolymer photoresist is processed to cleave at least some block copolymer bonds in the exposed selected regions. The exposed pinning layer is processed to create a chemical epitaxial pattern to direct the local self assembly of the block copolymer.
    Type: Application
    Filed: September 8, 2015
    Publication date: December 31, 2015
    Inventors: Gregory D. COOPER, Brian L. WEHRENBERG
  • BLOCK CO-POLYMER PHOTORESIST
    Publication number: 20150168842
    Abstract: An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer. The block copolymer has two blocks A and B that do not self-assemble under at least some annealing conditions. The exposed block copolymer photoresist is processed to cleave at least some block copolymer bonds in the exposed selected regions. The exposed pinning layer is processed to create a chemical epitaxial pattern to direct the local self assembly of the block copolymer.
    Type: Application
    Filed: March 3, 2015
    Publication date: June 18, 2015
    Inventors: Gregory D. COOPER, Brian L. WEHRENBERG
  • Block co-polymer photoresist
    Patent number: 8993221
    Abstract: An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer. The block copolymer has two blocks A and B that do not self-assemble under at least some annealing conditions. The exposed block copolymer photoresist is processed to cleave at least some block copolymer bonds in the exposed selected regions. The exposed pinning layer is processed to create a chemical epitaxial pattern to direct the local self assembly of the block copolymer.
    Type: Grant
    Filed: February 11, 2013
    Date of Patent: March 31, 2015
    Assignee: Pixelligent Technologies, LLC
    Inventors: Gregory D. Cooper, Brian L. Wehrenberg
  • NANOCOMPOSITES WITH HIGH DIELECTRIC CONSTANT
    Publication number: 20110315914
    Abstract: A nanocomposite with high dielectric constant includes both ferroelectric with non-ferroelectric fillers. This may improve, not only the dielectric constant of the nanocomposite but also provide additional thermal, electrical, optical, mechanical, or chemical properties to the nanocomposite for specific applications.
    Type: Application
    Filed: June 29, 2011
    Publication date: December 29, 2011
    Applicant: PIXELLIGENT TECHNOLOGIES, LLC
    Inventors: ZHIYUN CHEN, JUN XU, BRIAN L. WEHRENBERG, ZEHRA SERPIL GONEN-WILLIAMS, GREGORY D. COOPER
  • SYSTEM AND METHOD FOR DIRECT CONVERSION OF SOLAR ENERGY TO CHEMICAL ENERGY
    Publication number: 20110056841
    Abstract: Semiconductor nano-sized particles possess unique properties, which make them ideal candidates for applications in solar electrochemical cells to produce chemical energy from solar energy. Coupled nanocrystal photoelectrochemical cells and several applications improve the efficiency of solar to chemical energy conversion.
    Type: Application
    Filed: September 9, 2010
    Publication date: March 10, 2011
    Applicant: PIXELLIGENT TECHNOLOGIES, LLC
    Inventors: Brian L. WEHRENBERG, Zehra Serpil GONEN WILLIAMS, Gregory D. COOPER, Zhiyun CHEN