Abstract: An apparatus may include a crucible configured to contain the melt, the melt having an exposed surface separated from a floor of the crucible by a first distance, a housing comprising a material that is non-contaminating to the melt, the housing comprising a plurality of sidewalls and a top that are configured to contact the melt, and a plurality of heating elements isolated from the melt and disposed along a transverse direction perpendicular to a pulling direction of the crystalline sheet, the plurality of heating elements being individually powered, wherein the plurality of heating elements are disposed at a second set of distances from the exposed surface of the melt that are less than the first distance, and wherein the plurality of heating elements are configured to vary a heat flux profile along the transverse direction when power is supplied individually to the plurality of heating elements.

Abstract: A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.

Abstract: A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.

Abstract: An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.

Abstract: An apparatus may include a crucible configured to contain the melt, the melt having an exposed surface separated from a floor of the crucible by a first distance, a housing comprising a material that is non-contaminating to the melt, the housing comprising a plurality of sidewalls and a top that are configured to contact the melt, and a plurality of heating elements isolated from the melt and disposed along a transverse direction perpendicular to a pulling direction of the crystalline sheet, the plurality of heating elements being individually powered, wherein the plurality of heating elements are disposed at a second set of distances from the exposed surface of the melt that are less than the first distance, and wherein the plurality of heating elements are configured to vary a heat flux profile along the transverse direction when power is supplied individually to the plurality of heating elements.

Abstract: An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.

Abstract: The invention relates to a holding device (1), especially for fixing a glass substrate during a cutting process. The holding device comprises a housing (2) and a plunger (3) which can be axially displaced in relation to the housing (2). The plunger has a first and a second end section (4, 5), the first end section (4) projecting from the housing (2) and having a suction element (6). The aim of the invention is inter alia to improve a known holding device in such a manner that the substrate can be approached and fixed almost without the application of force. The holding device (1) according to the invention is characterized in that the plunger (3) is received in the housing (2) by a pneumatic spring. A holding system (20) comprising a plurality of holding devices (1) is protected in a support plate (24), the support plate (24) having a vacuum channel collector (21) which is connected to vacuum channels (13) and which is connected to a common vacuum pump (14).

Abstract: The invention relates to a holding device (1), especially for fixing a glass substrate during a cutting process. Said holding device comprises a housing (2) and a plunger (3) which can be axially displaced in relation to the housing (2). The plunger has a first and a second end section (4, 5), the first end section (4) projecting from the housing (2) and having a suction element (6). The aim of the invention is inter alia to improve a known holding device in such a manner that the substrate can be approached and fixed almost without the application of force. The holding device (1) according to the invention is characterized in that the plunger (3) is received in the housing (2) by a pneumatic spring. A holding system (20) comprising a plurality of holding devices (1) is protected in a support plate (24), said support plate (24) having a vacuum channel collector (21) which is connected to vacuum channels (13) and which is connected to a common vacuum pump (14).