Abstract: An edge ring assembly is disclosed for use in a plasma processing chamber, which includes an RF conductive ring positioned on an annular surface of a base plate and configured to surround an upper portion of the baseplate and extend underneath an outer edge of a wafer positioned on the upper surface of the baseplate, and a wafer edge protection ring positioned above an upper surface of the RF conductive ring and configured to extend over the outer edge of the wafer. The protection ring has an inner edge portion with a uniform thickness, which extends over the outer edge of the wafer, a conical upper surface extending outward from the inner edge portion to a horizontal upper surface, an inner annular recess which is positioned on the upper surface of the RF conductive and configured to extend over the outer edge of the wafer.

Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.

Abstract: A pressure control valve assembly of a plasma processing chamber in which semiconductor substrates are processed includes a housing having an inlet, an outlet and a conduit extending between the inlet and the outlet, the inlet adapted to be connected to an interior of the plasma processing chamber and the outlet adapted to be connected to a vacuum pump which maintains the plasma processing chamber at desired pressure set points during rapid alternating phases of processing a semiconductor substrate in the chamber. A fixed slotted valve plate having a first set of parallel slots therein is fixed in the conduit such that gasses withdrawn from the chamber into the conduit pass through the first set of parallel slots. A movable slotted valve plate having a second set of parallel slots therein is movable with respect to the fixed slotted valve plate so as to adjust pressure in the chamber.

Abstract: An edge ring assembly is disclosed for use in a plasma processing chamber, which includes an RF conductive ring positioned on an annular surface of a base plate and configured to surround an upper portion of the baseplate and extend underneath an outer edge of a wafer positioned on the upper surface of the baseplate, and a wafer edge protection ring positioned above an upper surface of the RF conductive ring and configured to extend over the outer edge of the wafer. The protection ring has an inner edge portion with a uniform thickness, which extends over the outer edge of the wafer, a conical upper surface extending outward from the inner edge portion to a horizontal upper surface, an inner annular recess which is positioned on the upper surface of the RF conductive and configured to extend over the outer edge of the wafer.

Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.

Abstract: Provided is a substrate dechucking system of a plasma processing chamber adapted to remove a substrate from an ESC with reduction in voltage potential spike during dechucking of the substrate.

Abstract: A pressure control valve assembly of a plasma processing chamber in which semiconductor substrates are processed includes a housing having an inlet, an outlet and a conduit extending between the inlet and the outlet, the inlet adapted to be connected to an interior of the plasma processing chamber and the outlet adapted to be connected to a vacuum pump which maintains the plasma processing chamber at desired pressure set points during rapid alternating phases of processing a semiconductor substrate in the chamber. A fixed slotted valve plate having a first set of parallel slots therein is fixed in the conduit such that gasses withdrawn from the chamber into the conduit pass through the first set of parallel slots. A movable slotted valve plate having a second set of parallel slots therein is movable with respect to the fixed slotted valve plate so as to adjust pressure in the chamber.

Abstract: Provided is a substrate dechucking system of a plasma processing chamber adapted to remove a substrate from an ESC with reduction in voltage potential spike during dechucking of the substrate.

Abstract: An LED downlight fixture comprises an array of LEDs in thermal connectivity with a heatsink, the array of LEDs positioned adjacent a first aperture of a multi-piece reflector assembly, the multi-piece reflector assembly including a first reflector having the first aperture disposed in an upper portion of the first reflector and an opposed larger second aperture in a lower portion of the first reflector, a second reflector having a first aperture positioned adjacent the second aperture of the first reflector and a second aperture opposite the first aperture of the second reflector and defining a light exit passageway, a diffuser positioned proximal to and extending across the second aperture of the first reflector and the first aperture of the second reflector.

Abstract: A method for simulating the effect of trapped charge in an electrostatic chuck on the chuck performance comprises creating a trapped-charge electrical model having a trapped-charge capacitor and a gap-trapped resistor, and coupling the model to a plurality of voltage sources. The trapped-charge capacitor and the gap-trapped resistor may be varied in relation to a plurality of electrostatic chuck physical parameters.

Abstract: Provided is a substrate dechucking system of a plasma processing chamber adapted to remove a substrate from an ESC with reduction in voltage potential spike during dechucking of the substrate.

Abstract: A method for simulating the effect of trapped charge in an electrostatic chuck on the chuck performance comprises creating a trapped-charge electrical model having a trapped-charge capacitor and a gap-trapped resistor, and coupling the model to a plurality of voltage sources. The trapped-charge capacitor and the gap-trapped resistor may be varied in relation to a plurality of electrostatic chuck physical parameters.

Abstract: A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The controller compares detected breath alcohol levels of the vehicle operator with a threshold value, and is configured to prevent vehicle ignition if a breath alcohol level detected by the breath analyzer is greater than or equal to a threshold value. The controller also requires the vehicle operator to periodically take breath analyzer retests after vehicle ignition in order to allow vehicle operation to continue. The controller can reduce the frequency of periodic retests in response to one or more retests when the breath alcohol level of the vehicle operator is below a threshold value. The system may include a transdermal alcohol sensor, a mouth contamination sensor, a mouth contamination sensor, and redundant alcohol sensors.

Abstract: A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The breath analyzer detects the breath alcohol level of a vehicle operator and is configured to prevent vehicle ignition if a breath alcohol level is greater than or equal to a threshold value. The controller requires the vehicle operator to periodically take breath analyzer “retests” after vehicle ignition in order to allow vehicle operation to continue. The breath analyzer also includes a mouth contamination sensor that is configured to distinguish between contaminants in the mouth of a vehicle operator and alcohol contained within a deep lung breath sample of the vehicle operator. The controller may require a breath alcohol retest of the vehicle operator via the breath analyzer in response to detecting the presence of a contaminant within the mouth of the vehicle operator.

Abstract: A vehicle ignition interlock system includes a breath analyzer, a transdermal alcohol sensor configured to be worn by the vehicle operator, and a controller operably connected to the breath analyzer, to the transdermal alcohol sensor, and to an ignition system of the vehicle. The transdermal alcohol sensor is configured to be worn by the vehicle operator, and is configured to detect alcohol through the skin of the vehicle operator. The controller is configured to override one or more periodic breath analyzer retests if alcohol is not detected through the skin of the operator by the transdermal alcohol sensor. The controller is configured to increase the frequency of periodic breath analyzer retests of the vehicle operator in response to the transdermal alcohol sensor detecting alcohol through the skin of the operator. A proximity sensor detects proximity of the transdermal alcohol sensor relative to a vehicle operator area.

Abstract: A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The breath analyzer detects breath alcohol level of a vehicle operator and prevents vehicle ignition if a breath alcohol level is greater than or equal to a threshold value. The controller requires the vehicle operator to periodically take breath analyzer “retests” after vehicle ignition in order to allow vehicle operation to continue. The breath analyzer includes first and second alcohol sensors. The second alcohol sensor is a backup for the first alcohol sensor and becomes operational if the first alcohol sensor malfunctions. The first or second alcohol sensors may be a mouth contamination sensor that distinguishes between mouth contaminants and alcohol contained within a deep lung breath sample. The system also includes sensors configured to detect impact (abuse) and vehicle motion.

Abstract: A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The breath analyzer detects the breath alcohol level of a vehicle operator and is configured to prevent vehicle ignition if a breath alcohol level is greater than or equal to a threshold value. The controller requires the vehicle operator to periodically take breath analyzer “retests” after vehicle ignition in order to allow vehicle operation to continue. The breath analyzer also detects the presence of alcohol within the vehicle, such as alcohol emanating from an open container of alcohol. The controller may override one or more periodic retests if alcohol is not detected within the vehicle over a predetermined period of time. In addition, the controller may increase the frequency of periodic retests of the vehicle operator in response to detecting alcohol within the vehicle.

Abstract: A gas distribution apparatus delivers a coolant gas, such as helium, to an upper surface of a chuck for controlling a temperature of a wafer placed on the chuck. The gas distribution apparatus allows first and second zones, such as an inner zone and an outer zone of the chuck, to be supplied with a coolant gas at different pressures for control of the temperature across the wafer. The gas distribution apparatus includes a pressure and flow control system for supplying the coolant gas at selected pressures and bleed lines which provide the dual function of allowing rapid evacuation of the inner and outer zones and preventing excess pressure from one zone from migrating to another zone.