Abstract: Methods and systems are disclosed for inspection of a potential source location (PSL) at an industrial facility that has physical components, such as pipes and valves, that transport one or more gaseous materials. A computing device assist in refocusing a technician equipped with a network of mobile sensors and a handheld device/wand to detect a gaseous emission at the industrial facility. The mobile sensors capture measurements on a recurring basis to assist the technician responsible for operating the handheld device/wand to identify exactly which physical component located within a PSL at the industrial facility are causing fugitive emissions. The disclosed system and method update an initial PSL by considering the recurring measurements and/or other inputs (e.g., weather data) to reduce the area of the initial PSL, thus better instructing the mechanic to identify the fugitive emission.

Abstract: A controller can securely publish an application of a tenant by securely extending a network fabric into the networks of the tenant with virtual private networks and NAT. After a tenant deploys an application into one or more networks of the tenant, the tenant can indicate select applications to publish. The network controller assigns a network address from the routable address space of the network fabric to the application and a network address aggregate to each application connector that will front an instance of the application, which securely extends the network fabric into the tenant network. The network controller configures NAT rules in the network fabric and on the application connector to create a route for traffic of the application through the network fabric to the application instance using a fully qualified domain name assigned to the application without exposing a private network address of the application instance and preserving security of other resource on the tenant network.

Abstract: Techniques for wildcard based private application access are disclosed. In some embodiments, a system, a process, and/or a computer program product for wildcard based private application access includes receiving a request for access to an application over a secure access service edge (SASE) network for a user associated with an enterprise; determining if the request for access to the application matches a wildcard (e.g., the wildcard can be configured by an administrator of the enterprise for matching a fully qualified domain name (FQDN) for the application); and automatically configuring access information (e.g., IP address, protocol, and destination port) for the application that matches the wildcard.

Abstract: Systems and methods for processing crude methanol are disclosed. A crude methanol stream, comprising methanol and paraffin wax, is produced from syngas (carbon monoxide, carbon dioxide, and hydrogen). The crude methanol stream is cooled to form a partially condensed crude methanol stream, which is further separated in a vapor-liquid separator to form a liquid stream and a gas stream. The liquid stream is further cooled in a dewaxing unit to remove paraffin wax. The dewaxing unit includes two or more cooling units arranged in parallel such that when one of the cooling units is offline for cleaning, the methanol system does not need to be shut down.

Abstract: Systems and methods for processing crude methanol are disclosed. A crude methanol stream, comprising methanol and paraffin wax, is produced from syngas (carbon monoxide, carbon dioxide, and hydrogen). The crude methanol stream is cooled to form a partially condensed crude methanol stream, which is further separated in a vapor-liquid separator to form a liquid stream and a gas stream. The liquid stream is further cooled in a dewaxing unit to remove paraffin wax. The dewaxing unit includes two or more cooling units arranged in parallel such that when one of the cooling units is offline for cleaning, the methanol system does not need to be shut down.

Abstract: This invention relates to an ethylene polymer comprising ethylene and up to 5 mole % of at least one comonomer, wherein the ethylene polymer has an Mw, of 10,000 to 50,000, an Mw/Mn of between 1.5 to 4.5, a density of at least 0.925 g/cc, an unsaturation level of less than 1 per 1000 carbons, a melting point of at least 120° C., a Tc of greater than Z° C., where Z=0.501×(density in kg/m3)?367, and a Brookfield viscosity o at 140° C. of 100,000 mPas or more.

Abstract: This invention relates to an ethylene polymer comprising ethylene and up to 5 mole % of at least one comonomer, wherein the ethylene polymer has an Mw, of 10,000 to 50,000, an Mw/Mn of between 1.5 to 4.5, a density of at least 0.925 g/cc, an unsaturation level of less than 1 per 1000 carbons, a melting point of at least 120° C., a Tc of greater than Z, where Z=0.501×(density in kg/m3)?367, and a Brookfield viscosity o at 140° C. of 100,000 mPas or more.

Abstract: A board for testing DVD (Digital Versatile Disc) ROM (Read Only Memory) chip-set and associated circuit for generating radio frequency signals with phase difference are provided. The circuit includes signal potential dividers, high pass filters, and a phase shifter. The circuit receives a digital input signal, which has a predetermined frequency, generated by a chip test device. The radio frequency signals with phase difference for testing the analog circuit block of DVD ROM chipset are generated according to the received digital input signal. Therefor, the high temperature operating life test for optical disc drive chips can be achieved.

Abstract: A method for post-treating a dry-etched metal film is provided. The dry-etched metal film includes an unetched portion covered by a photoresist and an etched portion exposed from the photoresist and having thereon an etching by-product. According to the method, a stripping agent is used to remove the photoresist on the unetched portion, while reacting the stripping agent with the etching by-product to form a passivation layer on the exposed metal film. Then, a washing agent is used to remove the passivation layer after the photoresist is removed. A system for performing combined etching and stripping procedures of a metal film is also provided. The system comprises dry-etching chambers, stripping and cleaning chambers and a transportation device. In the stripping and cleaning chambers, the photoresist on the unetched portion is removed by a stripping agent and a passivation layer is formed on the etched portion by reacting the stripping agent.