Patents by Inventor Brian R. Harkness
Brian R. Harkness has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10473822Abstract: An optical element comprises an antireflective layer that is disposed on and in contact with a substrate. The antireflective layer has a refractive index of greater than 1 to less than 1.41 and has a pore size ranging from greater than 0 to less than 300 nm. The antireflective layer includes an outermost surface having a water contact angle ranging from greater than or equal to 70° to less than or equal to 120° as determined using ASTM 5946-04.Type: GrantFiled: April 7, 2015Date of Patent: November 12, 2019Assignee: Dow Silicones CorporationInventors: Fengqiu Fan, Brian R. Harkness, Jr., Junying Liu, Wei Rong, Takeaki Tsuda, Michael L. Bradford
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Publication number: 20160363698Abstract: An optical element comprises an antireflective layer that is disposed on and in contact with a substrate. The antireflective layer has a refractive index of greater than 1 to less than 1.41 and has a pore size ranging from greater than 0 to less than 300 nm. The antireflective layer includes an outermost surface having a water contact angle ranging from greater than or equal to 70° to less than or equal to 120° as determined using ASTM 5946-04.Type: ApplicationFiled: April 7, 2015Publication date: December 15, 2016Applicant: Dow Corning CorporationInventors: FENGQIU FAN, BRIAN R. HARKNESS, Jr., JUNYING LIU, WEI RONG, TAKEAKI TSUDA, MICHAEL L. BRADFORD
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Publication number: 20140291872Abstract: A gel has improved thermal stability and is the ultraviolet hydrosilylation reaction product of (A) an organopolysiloxane having an average of at least 0.1 silicon-bonded alkenyl group per molecule and (B) a cross-linker having an average of at least 2 silicon-bonded hydrogen atoms per molecule. (A) and (B) react via hydrosilylation in the presence of (C) a UV-activated hydrosilylation catalyst comprising at least one of platinum, rhodium, ruthenium, palladium, osmium, and iridium, and (D) a thermal stabilizer. The (D) thermal stabilizer is present in an amount of from about 0.01 to about 30 weight percent based on a total weight of (A) and (B) and having transparency to UV light sufficient for the ultraviolet hydrosilylation reaction product to form.Type: ApplicationFiled: October 5, 2012Publication date: October 2, 2014Inventors: Brian R. Harkness, Malinda N. Howell, Daesup Hyun, Jing Jiang, John J. Kennan, Kent R. Larson, Randall G. Schmidt, Shengqing Xu
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Publication number: 20140008697Abstract: A composition includes an organopolysiloxane component (A) comprising at least one of a disiloxane, a trisiloxane, and a tetrasiloxane, and has an average of at least two alkenyl groups per molecule. The composition further includes an organohydrogensiloxane component (B) having an average of at least two silicon-bonded hydrogen atoms per molecule. Components (A) and (B) each independently have at least one of an alkyl group and an aryl group and each independently have a number average molecular weight less than or equal to 1500 (g/mole). The composition yet further includes a catalytic amount of a hydrosilylation catalyst component (C), and titanium dioxide (TiO2) nanoparticles (D). The composition has a molar ratio of alkyl groups to aryl groups ranging from 1:0.25 to 1:3.0. A product of the present invention is the reaction product of the composition, which may be used to make a light emitting diode.Type: ApplicationFiled: December 6, 2011Publication date: January 9, 2014Inventors: Brian R. Harkness, Ann W. Norris, Shellene K. Thurston, Vishal Chhabra, Bharati S. Kulkarni, Nikhil R. Taskar
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Publication number: 20130256742Abstract: A composition includes an organopolysiloxane component (A) having at least one aryl group and having an average of at least two alkenyl groups per molecule. The composition further includes an organohydrogensiloxane component (B) having at least one of an alkyl group and an aryl group and an average of at least two silicon-bonded hydrogen atoms per molecule. Components (A) and (B) each independently have a number average molecular weight less than or equal to 1500 (g/mole). The composition yet further includes a catalytic amount of a hydrosilylation catalyst component (C), and metal-oxide nanoparticles (D) other than titanium dioxide (TiO2) nanoparticles. The composition has a molar ratio of alkyl groups to aryl groups ranging from 1:0.25 to 1:3.0. A product of the present invention is the reaction product of the composition, which may be used to make a light emitting diode.Type: ApplicationFiled: December 6, 2011Publication date: October 3, 2013Applicant: Dow Corning CorporationInventors: Brian R. Harkness, Ann W. Norris, Shellene K. Thurston, Masaaki Amako, Maki Itoh, Michitaka Suto
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Publication number: 20130256741Abstract: A composition of the present invention includes an organopolysiloxane component (A) comprising at least one of a disiloxane, a trisiloxane, and a tetrasiloxane, and has at least one of an alkyl group and an aryl group and has an average of at least two alkenyl groups per molecule. Component (A) has a number average molecular weight less than or equal to 1500 (g/mole). The composition further includes an organohydrogensiloxane component (B) having at least one of an alkyl group and an aryl group and having an average of at least two silicon-bonded hydrogen atoms per molecule. Component (B) has a number average molecular weight less than or equal to 1500 (g/mole). The composition yet further includes a catalytic amount of a hydrosilylation catalyst component (C). A product of the present invention is the reaction product of the composition, which may be used to make a light emitting diode.Type: ApplicationFiled: December 6, 2011Publication date: October 3, 2013Inventors: Brian R. Harkness, Ann W. Norris, Shellene K. Thurston
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Patent number: 6737117Abstract: Herein is disclosed a resin solution, comprising (a) about 0.1 solids wt % to about 50 solids wt % of an organosiloxane resin comprising the formula (RSiO3/2)x(R′SiO3/2)y, wherein R is selected from the group consisting of C4-C24 alkyl, C4-C24 alkenyl, C4-C24 alkoxy, C8-C24 alkenoxy, and C4-C24 substituted hydrocarbon; R′ is selected from the group consisting of —H, C1-C4 unsubstituted hydrocarbon, and C1-C4 substituted hydrocarbon; x is from about 5 mole % to about 75 mole %; y is from about 10 mole % to about 95 mole %; and x+y is at least about 40 mole %; and (b) about 50 solids wt % to about 99.9 solids wt % of a resin comprising at least about 90 mole % of the formula HSiO3/2.Type: GrantFiled: April 5, 2002Date of Patent: May 18, 2004Assignee: Dow Corning CorporationInventors: Ronald P. Boisvert, Duane R. Bujalski, Brian R. Harkness, Zhongtao Li, Kai Su, Bianxiao Zhong
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Publication number: 20030191267Abstract: Herein is disclosed a resin solution, comprising (a) about 0.1 solids wt % to about 50 solids wt % of an organosiloxane resin comprising the formula (RSiO3/2)x(R′SiO3/2)y, wherein R is selected from the group consisting of C4-C24 alkyl, C4-C24 alkenyl, C4-C24 alkoxy, C8-C24 alkenoxy, and C4-C24 substituted hydrocarbon; R′ is selected from the group consisting of —H, C1-C4 unsubstituted hydrocarbon, and C1-C4 substituted hydrocarbon; x is from about 5 mole % to about 75 mole %; y is from about 10 mole % to about 95 mole %; and x+y is at least about 40 mole %; and (b) about 50 solids wt % to about 99.9 solids wt % of a resin comprising at least about 90 mole % of the formula HSiO3/2.Type: ApplicationFiled: April 5, 2002Publication date: October 9, 2003Inventors: Ronald P. Boisvert, Duane R. Bujalski, Brian R. Harkness, Zhongtao Li, Kai Su, Bianxiao Zhong
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Patent number: 6258506Abstract: The instant invention pertains to a curable composition comprising (a) substance that generates free radicals under the action of ultraviolet radiation and (b) polymer molecule bearing functionality capable of polymerization under the action of said free radicals wherein (a) is a benzoin ether and makes up from 0.001 to 10 wt % of the total composition and (b) has the following formula (R3SiO1/2)a(R′2SiO2/2)b(R″SiO3/2)c(SiO4/2)d in which R, R′, and R″ are each H or C1 to C10 hydrocarbyl possibly containing a heteroatom and at least 10 % is, for example, a vinyl group, and a+b+c+d=1. The composition of the instant invention is a storage-stable UV-curable composition that does not suffer from cure inhibition by air or oxygen, that is very efficiently cured by low doses of UV radiation, and provides a highly heat-resistant cured pattern by heating after pattern formation.Type: GrantFiled: June 1, 1999Date of Patent: July 10, 2001Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 6096483Abstract: The present invention provides a curable composition which comprises (A) a base-generating substance which generates a base when exposed to the action of ultraviolet light, (B) a siloxane polymer which has silicon-hydrogen bonds (Si--H) capable of reacting with hydroxy groups under the effect of the base to form silicon-oxygen bonds (Si--O) and hydrogen molecules (H.sub.2), and (C) an acid substance. This composition is cured by irradiation with ultraviolet light. During this ultraviolet irradiation, a mask is placed between a coating film of the composition and the radiation source, and the uncured portions of the composition are dissolved and removed so that a pattern is formed. The residual portions are then heated to produce a pattern-cured product.Type: GrantFiled: March 31, 1997Date of Patent: August 1, 2000Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 6051625Abstract: The instant invention pertains to a curable composition comprising(a) substance that generates free radicals under the action of ultraviolet radiation and(b) polymer molecule bearing functionality capable of polymerization under the action of said free radicals wherein (a) is a benzoin ether and makes up from 0.001 to 10 wt % of the total composition and (b) has the following formula(R.sub.3 SiO.sub.1/2).sub.a (R'.sub.2 SiO.sub.2/2).sub.b (R"SiO.sub.3/2).sub.c (SiO.sub.4/2).sub.din which R, R', and R" are each H or C.sub.1 to C.sub.10 hydrocarbyl possibly containing a heteroatom and at least 10% is, for example, a vinyl group, and a+b+c+d=1. The composition of the instant invention is a storage-stable UV-curable composition that does not suffer from cure inhibition by air or oxygen, that is very efficiently cured by low doses of UV radiation, and provides a highly heat-resistant cured pattern by heating after pattern formation.Type: GrantFiled: June 24, 1997Date of Patent: April 18, 2000Assignee: Dow Corning Asia, LTD.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 5908660Abstract: A method for the preparation of hydrophobic precipitated silicas which are useful, for example, as reinforcing fillers in rubber compositions. The method comprises two steps, where in the first step an aqueous suspension of precipitated silica is contacted with an organosilicon compound in the presence of a catalytic amount of an acid to effect hydrophobing of the precipitated silica. In the second step the aqueous suspension of the hydrophobic precipitated silica is contacted with a water-immiscible organic solvent at a solvent to silica weight ratio greater than 5:1 to effect separation of the hydrophobic precipitated silica from the aqueous phase.Type: GrantFiled: September 3, 1997Date of Patent: June 1, 1999Assignee: Dow Corning CorporationInventors: Phillip J. Griffith, Brian R. Harkness, William Herron, Rosemary M. Taylor, David J. Wilson
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Patent number: 5861235Abstract: This invention pertains to a curable composition comprising a N-substituted 4-(o-nitrophenyl)dihydropyridine (a compound that generates base under the action of ultraviolet radiation) and a silanol-containing polymer that condenses under the action of the base generated to form a siloxane bond. The compositions of the instant invention cure by exposure to ultraviolet radiation. Cured patterns may be formed from the curable composition by interposing a mask between a film of the said composition and the radiation source during UV exposure, then dissolving and removing the uncured composition to form a pattern, and thereafter heating the residual material. The compositions can be cured by low-strength ultraviolet radiation and produce a highly heat-resistant cured product.Type: GrantFiled: June 24, 1997Date of Patent: January 19, 1999Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 5820944Abstract: The present invention pertains to a curable composition which comprises a) a N-substituted 4-(o-nitrophenyl)dihydropyridine which constitutes a base-generating substance that is caused to generate a base by the action of ultraviolet light, and (b) a silicone polymer (R.sub.2 SiO.sub.2/2)(RSiO.sub.3/2) containing silicon-hydrogen bonds (Si--H) which are capable of reacting with hydroxy groups to form silicon-oxygen bonds (Si--O) and hydrogen molecules (H.sub.2) under the effect of the base. This composition is cured by irradiation with ultraviolet light. Patterns are formed by placing a mask between a coating film of the composition and the ultraviolet light source during the irradiation with ultraviolet light, and then dissolving and removing the uncured portions of the composition following said irradiation.Type: GrantFiled: March 31, 1997Date of Patent: October 13, 1998Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 5614603Abstract: The introduction of a highly spin-coatable silicone resin that does not produce large amounts of volatiles during its cure, and that is a precursor to highly heat-resistant, optically transparent cured products that exhibit an excellent hardness. The silicone resin comprises a silicone polymer of the general formula:(Ph.sub.2 SiO).sub.a (HSiO.sub.3/2).sub.b (R.sup.1 SiO.sub.3/2).sub.cin which R.sup.1 is hydrogen or C.sub.1 to C.sub.8 hydrocarbon group, possibly containing a heteroatom, Ph is a phenyl group and 6.ltoreq.a+b+c.ltoreq.1,000, 0.6>a/(a+b+c).gtoreq.0.4, and 1.0.gtoreq.b/(b+c).gtoreq.0.2.Type: GrantFiled: January 31, 1996Date of Patent: March 25, 1997Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takeuchi
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Patent number: 5516871Abstract: There is disclosed a diphenylsiloxane oligomer functionalized at both terminals and methods for the preparation thereof, said oligomer having the following general formulaG-(OSiPh.sub.2).sub.m O-G (i)wherein Ph denotes a phenyl radical, m is 3 to 50 and G has a formula independently selected from the group consisting of ##STR1## in which R, R.sup.4 and R.sup.5 are independently selected from the group consisting of methyl, phenyl and R.sup.1, R.sup.1 is selected from the group consisting of hydrogen and a monovalent hydrocarbon group having 2 to 8 carbon atoms excluding phenyl, tolyl, xylyl, and ethylphenyl radicals, Q is a divalent hydrocarbon group and k is independently 0 to 3 at each terminus of said oligomer with the proviso that k is >0 at one terminus of said oligomer, at least one substituent among R, R.sup.4 and R.sup.5 in formula (ii) is R.sup.1 and, when both R.sup.4 and R.sup.5 groups at one terminus of said oligomer are phenyl, groups R.sup.4 and R.sup.Type: GrantFiled: March 21, 1995Date of Patent: May 14, 1996Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa
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Patent number: 5502229Abstract: There is disclosed a diphenylsiloxane oligomer functionalized at both terminals, and methods for the preparation thereof, said oligomer having the following general formula G-(OSi(Ph).sub.2).sub.m O--G wherein Ph denotes a phenyl radical, m is 3 to 50 and G is has a formula independently selected from the group consisting of ##STR1## in which R.sup.1 is independently selected from the group consisting of hydrogen and a monovalent hydrocarbon group having 2 to 8 carbon atoms, said monovalent hydrocarbon group excluding phenyl, tolyl, xylyl, and ethylphenyl radicals, R is independently selected from the group consisting of R.sup.1, methyl radical and phenyl radical, Q is a divalent hydrocarbon group and n is an integer having a value of 1 to 3.Type: GrantFiled: March 14, 1995Date of Patent: March 26, 1996Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takeuchi