Patents by Inventor Brian Rounsaville

Brian Rounsaville has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Boron diffusion in silicon devices
    Patent number: 7790574
    Abstract: Disclosed are various embodiments that include a process, an arrangement, and an apparatus for boron diffusion in a wafer. In one representative embodiment, a process is provided in which a boric oxide solution is applied to a surface of the wafer. Thereafter, the wafer is subjected to a fast heat ramp-up associated with a first heating cycle that results in a release of an amount of boron for diffusion into the wafer.
    Type: Grant
    Filed: December 13, 2005
    Date of Patent: September 7, 2010
    Assignee: Georgia Tech Research Corporation
    Inventors: Ajeet Rohatgi, Dong Seop Kim, Kenta Nakayashiki, Brian Rounsaville
  • Boron diffusion in silicon devices
    Publication number: 20060183307
    Abstract: Disclosed are various embodiments that include a process, an arrangement, and an apparatus for boron diffusion in a wafer. In one representative embodiment, a process is provided in which a boric oxide solution is applied to a surface of the wafer. Thereafter, the wafer is subjected to a fast heat ramp-up associated with a first heating cycle that results in a release of an amount of boron for diffusion into the wafer.
    Type: Application
    Filed: December 13, 2005
    Publication date: August 17, 2006
    Inventors: Ajeet Rohatgi, Dong Kim, Kenta Nakayashiki, Brian Rounsaville