Patents by Inventor Brian S. Ward

Brian S. Ward has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7966582
    Abstract: One embodiment of the present invention provides techniques and systems for modeling long-range extreme ultraviolet lithography (EUVL) flare. During operation, the system may receive an evaluation point in a layout. Next, the system may receive an EUVL model which includes kernels that are discretized at different sampling rates, and which have different sized ambits. Specifically, a kernel that is discretized using a low sampling rate may have a longer range than a kernel that is discretized using a high sampling rate. The system may then convolve the kernels with the layout at the evaluation point over their respective ambits. Next, the system may use the convolution results to determine an indicator value. The indicator value can be used for a number of applications, e.g., to predict pattern shapes that are expected to print on a wafer, to perform optical proximity correction, or to identify manufacturing problem areas in the layout.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: June 21, 2011
    Assignee: Synopsys, Inc.
    Inventors: Lawrence S. Melvin, III, Brian S. Ward, Kunal N. Taravade
  • Publication number: 20090292508
    Abstract: One embodiment of the present invention provides techniques and systems for modeling long-range extreme ultraviolet lithography (EUVL) flare. During operation, the system may receive an evaluation point in a layout. Next, the system may receive an EUVL model which includes kernels that are discretized at different sampling rates, and which have different sized ambits. Specifically, a kernel that is discretized using a low sampling rate may have a longer range than a kernel that is discretized using a high sampling rate. The system may then convolve the kernels with the layout at the evaluation point over their respective ambits. Next, the system may use the convolution results to determine an indicator value. The indicator value can be used for a number of applications, e.g., to predict pattern shapes that are expected to print on a wafer, to perform optical proximity correction, or to identify manufacturing problem areas in the layout.
    Type: Application
    Filed: May 23, 2008
    Publication date: November 26, 2009
    Applicant: SYNOPSYS, INC.
    Inventors: Lawrence S. Melvin, III, Brian S. Ward, Kunal N. Taravade
  • Patent number: 5018053
    Abstract: The present invention discloses illuminated jewelry which is adapted for use as an earring, lapel pin broach, tie clip, cuff link, etc. A light source, such as an LED, is molded with a non-conducting, light transmissive material, which is preferably faceted to provide multiple reflected images of the illuminated light source. A power source, such as a small battery, is held by a retainer which provides electrical contact with one terminal of the power source. A lead finding is pivotally secured to the retainer at one end, and is secured at the opposite end to the light source. A lead post is secured to the light source, and positioned to contact the opposite terminal of the power source to energize the light source when the retainer is moved to a closed position. When the retainer is moved to an open position, the circuit between the power supply and the light source is broken. A biasing means is disposed between the retainer and the lead finding, to urge the illuminated jewelry open and closed positions.
    Type: Grant
    Filed: October 18, 1990
    Date of Patent: May 21, 1991
    Assignee: Lazerware, Inc.
    Inventors: James D. Belknap, Brian S. Ward