Abstract: A metering pump system for supplying an aqueous chemical to treat water includes first and second metering pumps connected to a common suction line and a common discharge line and operable to supply a desired chemical feed rate, an electronic flowrate sensor in communication with one of the common suction line and the common discharge line to measure an actual flowrate of the metering pump system, a controller in communication with the metering pumps and the electronic flowrate sensor, and a control loop implemented by the controller to operate one or more of the metering pumps to correct a deviation between the desired chemical feed rate and the actual flowrate measured by the electronic flowrate sensor.

Abstract: A metering pump system for supplying an aqueous chemical to a destination stock includes a first metering pump and a second metering pump connected to a common suction line and a common discharge line and operable to supply a desired chemical feed rate, an electronic flowrate sensor in communication with one of the common suction line and the common discharge line to measure an actual flowrate of the metering pump system, a controller in communication with the first metering pump, the second metering pump, and the electronic flowrate sensor, a control loop in use implemented by the controller to operate one or more of the first metering pump and the second metering pump to correct a deviation between the desired chemical feed rate and the actual flowrate measured by the electronic flowrate sensor.

Abstract: A chemical injector includes a body forming a fluid passage extending from an inlet through an outlet, an injection port connected to the fluid passage, an anodic portion of the fluid passage having a first electrical charge and a cathode having a second electrical charge in communication with the fluid passage. The fluid passage may include a constriction such as in an orifice or venturi device.

Abstract: A chemical injector includes a body forming a fluid passage extending from an inlet through an outlet, an injection port connected to the fluid passage, an anodic portion of the fluid passage having a first electrical charge and a cathode having a second electrical charge in communication with the fluid passage. The fluid passage may include a constriction such as in an orifice or venturi device.

Abstract: A device and method for continuously controlling the flow rate of an aqueous chemical drawn into a flowing fluid stock includes a metering assembly drawing the aqueous chemical into the inlet of a metering assembly through a flow rate sensor and then through a metering device and into the flowing fluid stock. The flow sensor is monitored and an electronic controller can adjusts the flow rate of the aqueous chemical through the metering device in response to monitoring the flow rate sensor. An electronic controller can also change the direction of the flow of the aqueous chemical into the flowing fluid stock through one ejector to another ejector in response to monitoring at the metering assembly.

Abstract: A device and method for continuously controlling the flow rate of an aqueous chemical drawn into a flowing fluid stock includes a metering assembly drawing the aqueous chemical into the inlet of a metering assembly through a flow rate sensor and then through a metering device and into the flowing fluid stock. The flow sensor is monitored and an electronic controller can adjusts the flow rate of the aqueous chemical through the metering device in response to monitoring the flow rate sensor. An electronic controller can also change the direction of the flow of the aqueous chemical into the flowing fluid stock through one ejector to another ejector in response to monitoring at the metering assembly.

Abstract: A chemical feeder system includes an aqueous chemical contained in a chemical source, the chemical source connected with a fluid stock through a chemical flow conduit and a feeder assembly connected within the chemical flow conduit that includes a metering device, a flow rate sensor and a controller operationally connected between the flow rate sensor and the metering device. A method of controlling the flow rate a treating chemical is applied to a fluid stock includes the steps of positioning a flow sensor upstream of a chemical metering device in a chemical flow conduit between a chemical source and fluid stock, flowing a treating chemical from the source through the chemical flow conduit, determining a desired application flow rate of the treating chemical and adjusting the metering device in response to a flow rate reading at the flow rate sensor to achieve the desired application flow rate.