Patents by Inventor Brian Strate

Brian Strate has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100097704
    Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.
    Type: Application
    Filed: December 14, 2009
    Publication date: April 22, 2010
    Applicant: Cymer, Inc.
    Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
  • Patent number: 7653112
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.
    Type: Grant
    Filed: February 28, 2008
    Date of Patent: January 26, 2010
    Assignee: Cymer, Inc.
    Inventors: Walter D. Gillespie, Brian Strate
  • Publication number: 20080151944
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.
    Type: Application
    Filed: February 28, 2008
    Publication date: June 26, 2008
    Applicant: Cymer, Inc.
    Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
  • Patent number: 7366219
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pu
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: April 29, 2008
    Assignee: Cymer, Inc.
    Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
  • Publication number: 20060114957
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pu
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: J. Martin Algots, Robert Bergstedt, Walter Gillespie, Vladimir Kulgeyko, William Partlo, German Rylov, Richard Sandstrom, Brian Strate, Timothy Dyer
  • Publication number: 20050226301
    Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall.
    Type: Application
    Filed: March 31, 2004
    Publication date: October 13, 2005
    Inventors: William Partlo, Yoshiho Amada, James Carmichael, Timothy Dyer, Walter Gillespie, Bryan Moosman, Richard Morton, Curtis Rettig, Brian Strate, Thomas Steiger, Fedor Trintchouk, Richard Ujazdowski
  • Publication number: 20050047471
    Abstract: A method and apparatus for operating a gas discharge laser is disclosed which may comprise a laser chamber containing a laser gas, the laser gas comprising a halogen, two elongated electrode elements defining a cathode and an anode, each of the cathode and anode having an elongated discharge receiving region having a discharge receiving region width defining a width of an electric discharge between the electrode elements in the laser gas, the discharge receiving region defining two longitudinal edges, and the anode comprising: a first elongated anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region of the anode, a pair of second elongated anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an elongated electrode center base portion integral with the fi
    Type: Application
    Filed: June 25, 2004
    Publication date: March 3, 2005
    Inventors: Thomas Steiger, Richard Ujazdowski, Timothy Dyer, Thomas Duffey, Walter Gillespie, Bryan Moosman, Richard Morton, Brian Strate
  • Patent number: 6661826
    Abstract: A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece elongated electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
    Type: Grant
    Filed: June 7, 2002
    Date of Patent: December 9, 2003
    Assignee: Cymer, Inc.
    Inventors: Richard C. Ujazdowski, Timothy S. Dyer, William N. Partlo, Michael Altheim, Brian Strate, Thomas Hofmann
  • Publication number: 20020196830
    Abstract: A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece elongated electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
    Type: Application
    Filed: June 7, 2002
    Publication date: December 26, 2002
    Inventors: Richard C. Ujazdowski, Timothy S. Dyer, William N. Partlo, Michael Altheim, Brian Strate, Thomas Hofmann