Abstract: A semiconductor substrate includes a first semiconductor layer, a first dielectric layer coupled to the first semiconductor layer, and a second semiconductor layer coupled to the first dielectric layer. The second semiconductor layer includes a base portion substantially aligned with the first dielectric layer and a cantilever portion protruding from an end of the first dielectric layer. The cantilever portion includes a tapered surface tapering from a bottom surface of the second semiconductor layer toward a top surface of the second semiconductor layer.

Abstract: The present invention is a device and method for ozonating water and applying the ozonated water to surfaces for cleaning purposes. The instant invention allows a user to transform water into a liquid with more robust cleaning properties conveniently and in a short time. The present invention includes a cleaning apparatus having a reservoir containing water, the reservoir able to be easily manipulated by a user to dispense the water, a device for increasing the level of oxidative properties in the water, and a circulation flow path communicating with the reservoir and the device to allow at least some of the water in the reservoir to flow from the reservoir to the device and back to the reservoir.

Abstract: The present invention is a device and method for ozonating water and applying the ozonated water to surfaces for cleaning purposes. The instant invention allows a user to transform water into a liquid with more robust cleaning properties conveniently and in a short time. The present invention includes a cleaning apparatus having a reservoir containing water, the reservoir able to be easily manipulated by a user to dispense the water, a device for increasing the level of oxidative properties in the water, and a circulation flow path communicating with the reservoir and the device to allow at least some of the water in the reservoir to flow from the reservoir to the device and back to the reservoir.