Abstract: The present invention provides a grooving tool for machining the surface of a polymeric foam article, such as a chemical mechanical (CMP) polishing pad, the grooving tool comprising a flat bed platen on which the article sits, a grooving tool frame having a front face positioned parallel to and facing the flat surface of the polymeric foam article on which front face is contained one or more cutting tool teeth arranged in a predetermined direction and with a constant pitch. Each cutting tool tooth has a non-cutting shoulder where it joins the grooving tool frame (i) a groove cutting face that forms a rake angle ranging from 2° to 80°, (ii) a chip ejection face located on the top of the tooth between the non-cutting shoulder and the groove cutting face and (iv) a shouldering radius transitioning from the cutting tool tooth to the non-cutting shoulder.

Abstract: The present invention provides a grooving tool for machining the surface of a polymeric foam article, such as a chemical mechanical (CMP) polishing pad, the grooving tool comprising a flat bed platen on which the article sits, a grooving tool frame having a front face positioned parallel to and facing the flat surface of the polymeric foam article on which front face is contained one or more cutting tool teeth arranged in a predetermined direction and with a constant pitch. Each cutting tool tooth has a non-cutting shoulder where it joins the grooving tool frame (i) a groove cutting face that forms a rake angle ranging from 2° to 80°, (ii) a chip ejection face located on the top of the tooth between the non-cutting shoulder and the groove cutting face and (iv) a shouldering radius transitioning from the cutting tool tooth to the non-cutting shoulder.

Abstract: The present invention provides an apparatus for use in mixing and dispensing a curable fluid stream (stream) into an open mold to fill the mold to make polishing pads for chemical mechanical planarization of substrates. The apparatus comprises an actuator frame on which is mounted (i) a set of two plates releasably attached to the actuator frame and adapted to cut the stream when the mold is full and to release from the actuator frame after cutting the stream, and (ii) a dispenser unit for continuous pouring of the stream into an open mold, the apparatus adapted to enable removal of the released plates from the actuator during the continuous pouring after the mold is full, e.g. by raising the actuator frame and the (ii) dispenser unit, whereby one can place a container above the mold to catch the plates.

Abstract: The present invention provides an apparatus for use in mixing and dispensing a curable fluid stream (stream) into an open mold to fill the mold to make polishing pads for chemical mechanical planarization of substrates. The apparatus comprises an actuator frame on which is mounted (i) a set of two plates releasably attached to the actuator frame and adapted to cut the stream when the mold is full and to release from the actuator frame after cutting the stream, and (ii) a dispenser unit for continuous pouring of the stream into an open mold, the apparatus adapted to enable removal of the released plates from the actuator during the continuous pouring after the mold is full, e.g. by raising the actuator frame and the (ii) dispenser unit, whereby one can place a container above the mold to catch the plates.

Abstract: A method of manufacturing grooved polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of defects in the polishing layers are minimized.

Abstract: A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.

Abstract: A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.

Abstract: A method of manufacturing grooved polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of defects in the polishing layers are minimized.

Abstract: A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.

Abstract: A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.