Patents by Inventor Brian Tompson

Brian Tompson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Robotically loaded epitaxial deposition apparatus
    Patent number: 5476359
    Abstract: A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
    Type: Grant
    Filed: October 29, 1992
    Date of Patent: December 19, 1995
    Assignee: Applied Materials, Inc.
    Inventors: David W. Severns, Brian Tompson, Paul R. Lindstrom, David K. Carlson
  • Robotically loaded epitaxial deposition apparatus
    Patent number: 5374159
    Abstract: A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
    Type: Grant
    Filed: April 8, 1993
    Date of Patent: December 20, 1994
    Assignee: Applied Materials, Inc.
    Inventors: David W. Severns, Brian Tompson, Paul R. Lindstrom, David K. Carlson
  • Robotically loaded epitaxial deposition apparatus
    Patent number: 5116181
    Abstract: A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
    Type: Grant
    Filed: May 19, 1989
    Date of Patent: May 26, 1992
    Assignee: Applied Materials, Inc.
    Inventors: David W. Severns, Brian Tompson, Paul R. Lindstrom, David K. Carlson
  • Robotically loaded epitaxial deposition apparatus
    Patent number: 5104276
    Abstract: A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
    Type: Grant
    Filed: August 16, 1991
    Date of Patent: April 14, 1992
    Assignee: Applied Materials, Inc.
    Inventors: David W. Severns, Brian Tompson, Paul B. Lindstrom, David K. Carlson