Abstract: A cooling tower system is disclosed. The cooling system includes a cooling tower; at least two make-up water inlet streams configured to supply water to the cooling tower; a blowdown stream configured to remove water from the cooling tower; at least one sensor monitoring water in each of the make-up water inlet streams; and a controller operably connected to the at least one sensor.

Abstract: A method of detecting and measuring the presence of ammonium fluoride in a buffered oxide etchant (“BOE”) composition is provided.

Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: The invention is directed towards methods and compositions for identifying the amount of ammonium acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of ammonium acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of ammonium acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the ammonium acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.

Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.

Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.

Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.

Abstract: A fluorometric method of ascertaining the purity of water used in semiconductor processing is described and claimed. A fluorometric method for monitoring and optionally controlling the water used in a semiconductor chip manufacturing process is also described.

Abstract: A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.

Abstract: A system and method for the detection and removal of copper from wastewater streams from semiconductor or printed circuit board manufacturing is described and claimed. The detection system and method involve the addition of a reagent that reacts with copper to quench the fluorophore present, with the decrease in fluorescence being detected by a fluorometer. The reduction of fluorescence is then used to calculate the amount of copper present in the form of Cu+2 ion in the wastewater. The removal system and method involve either the addition of a polymer that reacts with copper to form an insoluble precipitate with said precipitate then being removed by using any technique commonly known in the art; or the use of an ion exchange column to remove the copper from the wastewater stream.

Abstract: A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.

Abstract: The invention is a method of monitoring for the presence of certain constituents of food processing streams by measurement of fluorescence. The constituent monitored can be a fluorescing impurity of a food product, or the food product itself if such naturally fluoresces. Moreover, losses of the constituent to be monitored may be determined by concurrent measurement of fluorescence of a fluorescent material added to the food process stream. The method is applicable to the following food processing streams among others: meat, vegetable oil, sugar beet, sugar cane, grain, poultry, fruit and soybean processing streams. Upon determination of a variation of the fluorescing constituent to be measured, the food process can be adjusted accordingly.

Abstract: Leakage is detected between a process fluid and a temperature-conditioning fluid, or from a process fluid to a temperature-conditioning fluid, in an industrial process. The industrial process includes an A and a B fluid, and one of the A and B fluids receives heat from or transfer heat to the other of the A and the B fluids by an indirect contact method, and one but not both of the A and the B fluids is an industrial process fluid. At least one specie of tracer chemical is maintained in the A fluid, and that specie of tracer chemical is not a normal component of the B fluid. At least one of the A and the B fluids is subjected to at least one analysis at least one site. Such analysis at least detects the presence of the specie of tracer chemical when the fluid subjected to the analysis is the B fluid, and such analysis at least determines the concentration of the specie of tracer chemical when the fluid subjected to the analysis is the A fluid.