Patents by Inventor Brian Zaccheo

Brian Zaccheo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11984317
    Abstract: Techniques, structures, and materials related to extreme ultraviolet (EUV) lithography are discussed. Multiple patterning inclusive of first patterning a grating of parallel lines and second patterning utilizing EUV lithography to form plugs in the grating, and optional trimming of the plugs may be employed. EUV resists, surface treatments, resist additives, and optional processing inclusive of plug healing, angled etch processing, electric field enhanced post exposure bake are described, which provide improved processing reliability, feature definition, and critical dimensions.
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: May 14, 2024
    Assignee: Intel Corporation
    Inventors: Marie Krysak, James Blackwell, Lauren Doyle, Brian Zaccheo, Patrick Theofanis, Michael Robinson, Florian Gstrein
  • Publication number: 20210375616
    Abstract: Techniques, structures, and materials related to extreme ultraviolet (EUV) lithography are discussed. Multiple patterning inclusive of first patterning a grating of parallel lines and second patterning utilizing EUV lithography to form plugs in the grating, and optional trimming of the plugs may be employed. EUV resists, surface treatments, resist additives, and optional processing inclusive of plug healing, angled etch processing, electric field enhanced post exposure bake are described, which provide improved processing reliability, feature definition, and critical dimensions.
    Type: Application
    Filed: May 5, 2021
    Publication date: December 2, 2021
    Applicant: Intel Corporation
    Inventors: Marie Krysak, James Blackwell, Lauren Doyle, Brian Zaccheo, Patrick Theofanis, Michael Robinson, Florian Gstrein