Patents by Inventor Brittany R. Hoard

Brittany R. Hoard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping
    Patent number: 10483415
    Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: November 19, 2019
    Assignee: STC.UNM
    Inventors: Sang Eon Han, Brittany R. Hoard, Sang M. Han, Swapnadip Ghosh
  • METHODS TO INTRODUCE SUB-MICROMETER, SYMMETRY-BREAKING SURFACE CORRUGATION TO SILICON SUBSTRATES TO INCREASE LIGHT TRAPPING
    Publication number: 20180190841
    Abstract: Provided is a method for fabricating a nano-patterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
    Type: Application
    Filed: February 23, 2018
    Publication date: July 5, 2018
    Applicant: STC.UNM
    Inventors: Sang Eon Han, Brittany R. Hoard, Sang M. Han, Swapnadip Ghosh
  • Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping
    Patent number: 9941426
    Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: April 10, 2018
    Assignee: STC.UNM
    Inventors: Sang Eon Han, Brittany R. Hoard, Sang M. Han, Swapnadip Ghosh
  • METHODS TO INTRODUCE SUB-MICROMETER, SYMMETRY-BREAKING SURFACE CORRUGATION TO SILICON SUBSTRATES TO INCREASE LIGHT TRAPPING
    Publication number: 20170110602
    Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
    Type: Application
    Filed: December 23, 2016
    Publication date: April 20, 2017
    Applicant: STC.UNM
    Inventors: Sang Eon Han, Brittany R. Hoard, Sang M. Han, Swapnadip Ghosh
  • Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping
    Patent number: 9530906
    Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
    Type: Grant
    Filed: October 17, 2014
    Date of Patent: December 27, 2016
    Assignee: STC.UNM
    Inventors: Sang Eon Han, Brittany R. Hoard, Sang M. Han, Swapnadip Ghosh
  • METHODS TO INTRODUCE SUB-MICROMETER, SYMMETRY-BREAKING SURFACE CORRUGATION TO SILICON SUBSTRATES TO INCREASE LIGHT TRAPPING
    Publication number: 20160284886
    Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.
    Type: Application
    Filed: October 17, 2014
    Publication date: September 29, 2016
    Inventors: Sang Eon Han, Brittany R. Hoard, Sang M. Han, Swapnadip Ghosh