Patents by Inventor Bruce Adair Altemus

Bruce Adair Altemus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8962067
    Abstract: Processes for real time process control of the Polymer Dispersion Index (PDI) during polymerization processes. By tuning this chain length distribution in real time, a resulting polymer can have predetermined physical properties such as thickness, physical yield strength, decomposition time, thermal stability, etc. Techniques herein can dynamically control chain length distribution through use of a mass density measurement device located within a processing chamber and providing real time feedback of polymer growth. Chamber parameters can be controlled or modified before and during polymerization based on mass density feedback. Such chamber parameters can include pressure, temperature, chemistry, and process gas flow rates and flow periods.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: February 24, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Bruce Adair Altemus, Scott W. LeFevre
  • Publication number: 20140205742
    Abstract: Techniques disclosed herein include apparatus and processes for real time process control of the Polymer Dispersion Index (PDI) during polymerization processes. By tuning this chain length distribution in real time, a resulting polymer can have predetermined physical properties such as thickness, physical yield strength, decomposition time, thermal stability, etc. Techniques herein can dynamically control chain length distribution through use of a mass density measurement device located within a processing chamber and providing real time feedback of polymer growth. Chamber parameters can be controlled or modified before and during polymerization based on mass density feedback. Such chamber parameters can include pressure, temperature, chemistry, and process gas flow rates and flow periods.
    Type: Application
    Filed: January 24, 2013
    Publication date: July 24, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Bruce Adair Altemus, Scott W. LeFevre