Abstract: A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

Abstract: A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

Abstract: A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

Abstract: A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

Abstract: A neutron device may include a neutron emitter. The neutron emitter may include a target, an electron source, and a vacuum space in which ionization gas is disposed. The electron source may be configured to emit electrons toward the target when a voltage is applied between the target and the electron source. The vacuum space may be disposed between the target and the electron source. Reaction ions may be released when the electrons interact with the ionization gas. Neutrons may be emitted from the target when the reaction ions contact the target.

Abstract: An x-ray device may include a target that emits x-rays when subjected to electrons, an electron source configured to emit electrons toward the target, an elongated annular first shell connected to and supporting the electron source, and an elongated annular second shell connected to and supporting the target. The first shell and the second shell may be arranged one radially inside the other.

Abstract: Among various examples, one is directed to identifying one or more particular photocathode semiconductor structures via a computer-based method. The method includes calculating, for each of a plurality of semiconductor materials and via a database characterizing electronic band structures of respective semiconductor materials corresponding to the plurality of semiconductor materials, an intrinsic emittance score (e.g., using an optimistic selection of a work function) as a predictive screening metric for whether the semiconductor material may exhibit low intrinsic emittance.

Abstract: Embodiments of a method of pretreating a metal substrate prior to painting comprise applying a first coating solution onto the metal substrate wherein the first coating solution comprises polyaniline particles at a pH less than 7 to yield a first coating on the metal substrate, rinsing the metal substrate to remove unreacted polyaniline particles, and applying a second coating solution post-rinse which comprises at least one acid and a silane composition at a pH less than 7 to yield a second coating on the metal substrate.

Abstract: Embodiments of a method of pretreating a metal substrate prior to painting comprise applying a first coating solution onto the metal substrate wherein the first coating solution comprises polyaniline particles at a pH less than 7 to yield a first coating on the metal substrate, rinsing the metal substrate to remove unreacted polyaniline particles, and applying a second coating solution post-rinse which comprises at least one acid and a silane composition at a pH less than 7 to yield a second coating on the metal substrate.

Abstract: A method, program and system (10) for processing data are disclosed. The method, program and system comprising the steps of: (a) receiving data representing a location of an item (e.g., people, personal property, real property, organizations, chemical compounds, organic compounds, proteins, biological structures, biometric values or atomic structures), (c) determining a plurality of fixed coordinates that represent the location (e.g., by “rounding” and/or comparing to a reference grid), (d) utilizing an algorithm (e.g., encryption, encoding and/or one-way function) to process the plurality of fixed coordinates (each separately or together), and (e) comparing the processed data to at least a portion of secondary data (perhaps comprising data previously stored in a database).

Abstract: A method for determining a change in a position of a support is described. The method includes determining the change in the position of the support used in an imaging system, where determining the change includes computing the position by operating a photodetector configured to detect laser energy that provides information regarding the position.

Abstract: A method for measuring an alignment of a detector is described. The method includes determining, by a processor, the alignment of the detector with respect to a collimated radiation beam. The determination of the alignment is based on a plurality of signals from a first cell of the detector and a second cell of the detector, and is independent of a shape of the collimated radiation beam.

Abstract: A system for generating a tunable X-ray pulse comprises a first electron beam source configured to direct a first electron pulse of predetermined energy and pulse length towards a first interaction zone, a laser beam source configured to direct a first photon pulse of predetermined energy and pulse length towards the first interaction zone to interact with the first electron pulse. The first interaction produces a substantially monochromatic second photon pulse of higher photon energy directed towards a second interaction zone, and a second electron beam source configured to direct a second electron pulse of predetermined energy and pulse length towards the second interaction zone so that the second interaction produces an X-ray pulse of predetermined energy and pulse length in a cascaded inverse Compton scattering (ICS) configuration.

Abstract: A method and system for diagnosing an imaging system are provided. The method includes varying a system parameter of the imaging system. The method further includes obtaining a first data set at a first state of the varied system parameter and a second data set at a second state of the varied system parameter.

Abstract: An imaging tube (12) includes a cathode (30) that emits an electron beam (32) and an anode (38). The anode (38) includes multiple target surfaces (36). Each of the target surfaces (36) has a focal spot that receives the electron beam (32). The target surfaces (36) generate multiple x-ray beams (42) in response to the electron beam (32). Each x-ray beam (42) is associated with one of the target surfaces (36). An x-ray imaging system (10) includes the cathode (30) and the anode (38). A controller (28) is electrically coupled to the cathode (30) and adjusts emission of the electron beam (32) on the anode (38).

Abstract: An electron emitter assembly and a method for adjusting a power level of an electron beam are provided. The electron emitter assembly includes a laser configured to emit a first light beam. The electron emitter assembly further includes a light-attenuating device configured to receive the first light beam and to attenuate the first light beam between a first light intensity and a second light intensity greater than the first light intensity. The electron emitter assembly further includes a photo-cathode configured to receive the first light beam from the light-attenuating device. The photo-cathode is further configured to emit a first electron beam having a first power level in response to receiving the first light beam having the first light intensity. The photo-cathode is further configured to emit a second electron beam having a second power level greater than the first power level in response to receiving the first light beam having the second light intensity.

Abstract: An electron emitter assembly and a method for generating an electron beam are provided. The electron emitter assembly includes a laser configured to emit a first light beam and a second light beam. The electron emitter assembly further includes a mirror configured to move to a first operational position to reflect the first light beam toward a first region of a photo-cathode. The mirror is further configured to move to a second operational position to reflect the second light beam toward a second region of the photo-cathode. The photo-cathode is configured to emit a first electron beam when the first light beam contacts the first region and to emit a second electron beam when the second light beam contacts the second region. The electron emitter assembly further includes an anode configured to receive the first and second electron beams from the photo-cathode.

Abstract: An electron emitter assembly and a method for adjusting a size of electron beams are provided. The electron emitter assembly includes a laser configured to emit a first light beam. The electron emitter assembly further includes a lens assembly configured to receive the first light beam. The lens assembly is configured to adjust a size of the first light beam between a first predetermined size and a second predetermined size larger than the first predetermined size. The lens assembly emits the first light beam toward a photo-cathode. The photo-cathode is configured to emit a first electron beam having a third predetermined size when the first light beam having the first predetermined size contacts the photo-cathode. The photo-cathode is further configured to emit a second electron beam having a fourth predetermined size when the first light beam having the second predetermined size contacts the photo-cathode.

Abstract: An electron emitter assembly and a method for generating electron beams are provided. The electron emitter assembly includes a light source configured to emit light. The electron emitter assembly further includes a photo-responsive device operably coupled to an electron emitter device. The photo-responsive device induces the electron emitter device to emit electrons in response to receiving the light. Finally, the electron emitter assembly includes an anode receiving the emitted electrons from the electron emitter device.

Abstract: An field emitter array system (10) includes a housing (50). An emitter array (80) generates an electron beam and has multiple emitter elements (81) that are disposed within the housing (50). Each of the emitter elements has multiple activation connections (92).