Patents by Inventor Bruce E. Tripp

Bruce E. Tripp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aqueous quaternary ammonium hydroxide as a screening mask cleaner
    Patent number: 6351871
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: March 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Aqueous quaternary ammonium hydroxide as a screening mask cleaner
    Patent number: 6280527
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • System for cleaning residual paste from a mask
    Patent number: 6032683
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: March 7, 2000
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Optimized in-line mask cleaning system
    Patent number: 5916374
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: June 29, 1999
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Process for removing residue from screening masks with alkaline solution
    Patent number: 5888308
    Abstract: This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: March 30, 1999
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John U. Knickerbocker, Glenn A. Pomerantz, Bruce E. Tripp