Abstract: Methods to manufacture contaminant-gettering materials in the surface of EUV optics are described herein. An optical element is patterned and a contaminant-gettering material is formed on a surface of the optical element. In one embodiment, a photoresist is deposited on an optical coating on the optical element. Trenches are formed in the optical coating. The gettering agent is formed into the trenches over the photoresist. Next, the photoresist is removed from the optical coating to expose the gettering agent in the trenches. For another embodiment, patches of a nanotube forest having a gettering agent are formed in designated areas of an optical element. The gettering agent of the patches may be a plurality of carbon nanotubes. The optical coating is formed on a substrate between patches of the gettering agent.

Abstract: Methods to manufacture contaminant-gettering materials in the surface of EUV optics are described herein. An optical element is patterned and a contaminant-gettering material is formed on a surface of the optical element. In one embodiment, a photoresist is deposited on an optical coating on the optical element. Trenches are formed in the optical coating. The gettering agent is formed into the trenches over the photoresist. Next, the photoresist is removed from the optical coating to expose the gettering agent in the trenches. For another embodiment, patches of a nanotube forest having a gettering agent are formed in designated areas of an optical element. The gettering agent of the patches may be a plurality of carbon nanotubes. The optical coating is formed on a substrate between patches of the gettering agent.

Abstract: Methods to manufacture contaminant-gettering materials in the surface of EUV optics are described herein. An optical element is patterned and a contaminant-gettering material is formed on a surface of the optical element. In one embodiment, a photoresist is deposited on an optical coating on the optical element. Trenches are formed in the optical coating. The gettering agent is formed into the trenches over the photoresist. Next, the photoresist is removed from the optical coating to expose the gettering agent in the trenches. For another embodiment, patches of a nanotube forest having a gettering agent are formed in designated areas of an optical element. The gettering agent of the patches may be a plurality of carbon nanotubes. The optical coating is formed on a substrate between patches of the gettering agent.

Abstract: A viewport used by an end point detection system for chemical mechanical polishing (CMP) is attached to a platen that holds a CMP pad. During a CMP operation to polish a semiconductor wafer, the viewport is aligned with a hole in the CMP pad to permit optical access to the wafer by the end point detection system. The viewport shields optical components of the end point detection system from byproducts of the polishing, while also permitting the use of optical techniques to determine how much material has been polished from the surface of the wafer during the CMP operation.

Abstract: A pad conditioner having integral conditioning points. The pad conditioner includes a conditioning surface having a first integral conditioning point extending from the conditioning surface. For one embodiment the conditioning surface is formed of diamond and an array of integral conditioning points including the first integral conditioning point extends from the diamond surface.

Abstract: A pad conditioner having integral conditioning points. The pad conditioner includes a conditioning surface having a first integral conditioning point extending from the conditioning surface. For one embodiment the conditioning surface is formed of diamond and an array of integral conditioning points including the first integral conditioning point extends from the diamond surface.