Abstract: The specification discloses forming ceramic films, and especially high temperature superconductor films, by dissolving ceramic precursor metal iodides in organic solvents, applying them to a substrate, evaporating the solvent and pyrolyzing and annealing the resulting ceramic precursor metal iodide films.

Abstract: A single step method for boron dopant diffusion implementing both deposition and drive-in diffusions in one furnace process is provided. By using a spin-on dopant in a diffusion furnace with pyrogenic steam and thermal ramping capabilities, sheet resistivities and penetrations to a precision and accuracy of 4% with one furnace step are achievable. The one step method disclosed circumvents the use of two furnace processes to achieve a typical p-type diffusion which requires a deposition in a furnace set at one temperature followed by a drive in diffusion in a furnace set at a second temperature after deglazing in a hydrofluoric acid. Also attainable by the one step process disclosed are resistivity uniformities better than those with the two furnace processes.