Patents by Inventor Bruce J. Fender

Bruce J. Fender has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for high throughput photomask curing
    Patent number: 10962889
    Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: March 30, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Banqiu Wu, Eli Dagan, Khalid Makhamreh, Bruce J. Fender
  • Attachment feature removal from photomask in extreme ultraviolet lithography application
    Patent number: 10928724
    Abstract: Embodiments of the present disclosure generally provide apparatus and methods for removing an attachment feature utilized to hold a pellicle from a photomask. In one embodiment, an attachment feature removal apparatus for processing a photomask includes an attachment feature puller comprising an actuator, a clamp coupled to the actuator, the clamp adapted to grip an attachment feature, and a coil assembly disposed adjacent to the attachment feature.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: February 23, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Banqiu Wu, Eli Dagan, Khalid Makhamreh, Bruce J. Fender
  • ATTACHMENT FEATURE REMOVAL FROM PHOTOMASK IN EXTREME ULTRAVIOLET LITHOGRAPHY APPLICATION
    Publication number: 20200183268
    Abstract: Embodiments of the present disclosure generally provide apparatus and methods for removing an attachment feature utilized to hold a pellicle from a photomask. In one embodiment, an attachment feature removal apparatus for processing a photomask includes an attachment feature puller comprising an actuator, a clamp coupled to the actuator, the clamp adapted to grip an attachment feature, and a coil assembly disposed adjacent to the attachment feature.
    Type: Application
    Filed: October 23, 2019
    Publication date: June 11, 2020
    Inventors: Banqiu WU, Eli DAGAN, Khalid MAKHAMREH, Bruce J. FENDER
  • METHOD AND APPARATUS FOR HIGH THROUGHPUT PHOTOMASK CURING
    Publication number: 20200166834
    Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.
    Type: Application
    Filed: November 15, 2019
    Publication date: May 28, 2020
    Inventors: Banqiu WU, Eli DAGAN, Khalid MAKHAMREH, Bruce J. FENDER
  • SEMICONDUCTOR WAFER CLEANING WITH DILUTE ACIDS
    Publication number: 20100024847
    Abstract: In a method for cleaning wafers using ultra-dilute acids, the wafers are placed into a rotor in a process chamber. As the rotor spins, the wafers are with de-ionized water and ultra-dilute hydrofluoric acid. Ozone gas is introduced into the process chamber. The wafers are then sprayed with an ultra-dilute solution of hydrochloric acid. Ozone gas is purged from the chamber. The wafers are then rinsed and dried. The ultra-dilute acids may be used in water to acid concentrations on the order of about 1000-2400:1.
    Type: Application
    Filed: August 1, 2008
    Publication date: February 4, 2010
    Inventors: Ronald G. Breese, Benjamin Shafer, Dana R. Scranton, Bruce J. Fender