Abstract: A vial sleeve for a cryogenic vial includes a cover portion including a side wall defining a cavity for receiving at least a portion of the vial, and a locking feature configured to operatively engage at least a portion of the vial for resisting movement of the vial relative to the vial sleeve. The vial sleeve may include a first label adhered to an exterior surface of the side wall and including a first set of indicia. The first set of indicia may be different from a second set of indicia included on a second label adhered to an exterior surface of the vial.

Abstract: A vial sleeve for a cryogenic vial includes a cover portion including a side wall defining a cavity for receiving at least a portion of the vial, and a locking feature configured to operatively engage at least a portion of the vial for resisting movement of the vial relative to the vial sleeve. The vial sleeve may include a first label adhered to an exterior surface of the side wall and including a first set of indicia. The first set of indicia may be different from a second set of indicia included on a second label adhered to an exterior surface of the vial.

Abstract: A shock resistant and mode mixing resistant assembly for oscillating a device such as a MEMS mirror around a pivot axis by means of two pairs of piezoelectric elements or towers is provided. The resistance to mechanical shock and mode mixing is accomplished by mounting the broad faces or width of each piezoelectric element in a chevron shape so that the broad faces or width dimensions are not in parallel or aligned with each other. Mounting the piezoelectric elements so that the broad faces or width dimensions are at a 15 degree angle with respect to a line perpendicular to the pivot axis has been found to be especially effective.

Abstract: A shock resistant and mode mixing resistant assembly for oscillating a device such as a MEMS mirror around a pivot axis by means of two pairs of piezoelectric elements or towers is provided. The resistance to mechanical shock and mode mixing is accomplished by mounting the broad faces or width of each piezoelectric element in a chevron shape so that the broad faces or width dimensions are not in parallel or aligned with each other. Mounting the piezoelectric elements so that the broad faces or width dimensions are at a 15 degree angle with respect to a line perpendicular to the pivot axis has been found to be especially effective.

Abstract: Method and structure for mounting a torsional hinged device, such as a mirror, having a first TCE (thermal coefficient of expansion) on a substrate having a second TCE different than said first TCE. The structure comprising a plurality of compliant support posts between the substrate and the torsional hinged device that deform when the contraction and/or expansion of the torsional hinged device is different than the corresponding contraction and expansion of the substrate.

Abstract: The present invention relates to the authentication of parties involved in transactions performed remotely over a network, such as the Internet. When a first party initiates a transaction with a second party, the second party can request authentication of the first party. Authentication is carried out by sending a communication to the first party, which includes a redirection to a transaction specific location,. At the transaction specific location the first party is required to approve the transaction as well as answer some identifying question or questions. If the transaction is approved and the question or questions answered correctly, the second party is informed that the transaction can be approved.

Abstract: System and method for establishing and maintaining resonant oscillations of a torsional hinged device such as a pivotally hinged mirror. The system and methods comprise a permanent magnet mounted to the pivoting mirror that interacts with an electromagnetic coil. The magnetic coil is periodically connected and disconnected from a DC power supply in response to a series of drive pulses having a timing and duration such that the magnetic forces generated by the interaction of the permanent magnet and the electromagnetic coil maintains resonant oscillations of the device.

Abstract: System and method for establishing and maintaining resonant oscillations of a torsional hinged device such as a pivotally hinged mirror. The system and methods comprise a permanent magnet mounted to the pivoting mirror that interacts with an electromagnetic coil.

Abstract: A packaged micromirror assembly (10, 10′, 10″, 110) is disclosed. The assembly (10, 10′, 10″, 110) includes a mirror element (41) having a mirror surface (29) that can rotate in two axes. Magnets (53) are attached to the mirror element (41), to permit rotation of the mirror surface (29). Coil drivers (36) are attached to a circuit board (38) or to a lead frame (65, 65′). A plastic body (30, 70) is formed around the coil drivers (36) to have an upper surface with an inner shelf (34, 74) to which the mirror element (41) is attached, and an outer shelf (32, 72) to which a transparent window (31) is attached. A resistance heater (80) may be included within the body (30, 70) to prevent internal condensation in harsh environments. Alternative embodiments of the molded assembly (120, 150) include electrostatic plates (145, 146; 155, 156) that mate with widened gimbal portions (135, 136) of the mirror element (130) to electrostatically deflect the mirror surface (124).

Abstract: A process module which is compatible with a system using vacuum wafer transport in which wafers are generally transported and processed in a face down position under vacuum, and which also includes an additional wafer movement, wherein, after a wafer has been emplaced face down, in a position where it can be clamped against the susceptor, the susceptor is rotated from its approximately horizontal position up to a more nearly vertical position. In the more nearly vertical position, the wafer can be processed by a top process module, which may be, e.g., a sputter system, an implanter, or an inspection module. Another process module is included in the bottom part of the chamber, so that the wafer can be processed by the lower process module while in its substantially horizontal position and processed by the upper process module when it is in its more nearly vertical position. This is especially advantageous when the lower process module is a plasma cleanup module and the top module is a deposition module.

Abstract: A processing apparatus and method which permits sputter deposition and which is compatible with a vacuum processing system wherein the wafers are largely transferred and processed in the face down position. This includes an additional wafer movement, wherein, after a wafer has been emplaced face down, in a position where it can be clamped against the susceptor, the susceptor is rotated from its approximately horizontal position up to a more nearly vertical position. While the wafer is in the more nearly vertical position, sputter deposition may be performed. In situ or remote plasma capability is usefully provided in the bottom part of the chamber, so that a dry deglaze or cleanup step can be performed while the wafer is in its substantially horizontal position, followed by a sputter deposition after the wafer has been moved to its more nearly vertical position.

Abstract: There is provided a practice box for pole vaulters, which defines a wedge-shaped recess converging in the forward direction, open upwardly and open rearwardly. The practice box has side edges defining the convergence, which side edges are provided with means for retaining the inertial weight in such a way as to oppose a forward thrust in the practice box. In use the inertia of the practice box allows the vaulter at least to lift-off the ground, but the forward thrust exerted by the pole allows the vaulter to return to the ground without completing the jump. The purpose is to permit practice of the lift-off without requiring a full jump.