Abstract: Systems and methods for network-based ultrasound imaging are provided, which can include a number of features. In some embodiments, an ultrasound imaging system images an object with three-dimensional unfocused pings and obtains digital sample sets from a plurality of receiver elements. A sub-set of the digital sample sets can be electronically transferred to a remote server, where the sub-set can be beamformed to produce a series of two-dimensional image frames. A video stream made up of the series of two-dimensional images frames can then be transferred from the remote server to a display device.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube within a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube within a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube within a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube within a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube within a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube withm a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: A photolithographic exposure system for use on a photoresist on a substrate includes an illumination system, a photomask with one or more object patterns, a projection optical exposure system, and a fluid dispensing system. The projection optical exposure system is positioned to project an image of the one or more object patterns toward an image plane. The fluid dispensing system positions a fluid between the projection optical exposure system and the photoresist on the substrate. The fluid has a refractive index value above a refractive index value of water and an absorbance below 0.8 per millimeter at wavelengths between about 180 nm and about 300 nm.

Abstract: The present invention provides an apparatus for detecting and/or repositioning annulus spacers used to maintain the position of a pressure tube withm a calandria tube of a nuclear reactor. The method comprises the steps of: vibrationally isolating a section of the pressure tube; vibrating the wall of said pressure tube within said isolated section; detecting vibration of the wall at a minimum of two axial positions within said isolated sections; and detecting the reduction in vibration level of the wall at one or more of said axial positions in comparison to the remaining axial positions. The apparatus comprises a tool head to be inserted into the pressure tube, the tool head comprising a first end and a second and a clamping block m each of said ends. The clamping blocks are used to vibrationally isolate a section of the pressure tube located between said ends.

Abstract: Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging onto the image plane with the system. The test target comprises at least one open figure which comprises a multiple component array of phase zones, where the multiple zones are arranged within the open figure so that their response to lens aberration is interrelated and the zones respond uniquely to specific aberrations depending on their location within the figure. This is a unique and new method of detecting a variety of aberration types including coma, spherical, astigmatism, and three-point through the imaging onto photosensitive material or image detector placed in the image plane of the system and the evaluation of these images.

Abstract: Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging a photoresist film with the system. The test target comprises at least one open figure which comprises a multiple component array of phase zones, where the multiple zones are arranged within the open figure so that their response to lens aberration is interrelated and the zones respond uniquely to specific aberrations depending on their location within the figure. This is a unique and new method of detecting a variety of aberration types including coma, spherical, astigmatism, and three-point through the exposure of a photoresist material placed in the image plane of the system and the evaluation of these images.

Abstract: A method for improved imaging performance of a microlithography photomask is described. By providing sub resolution evanescent wave assist features in regions surrounding a main photomask feature, the coupling of the evanescent energy from these features can add to the transmission efficiency of the main feature. The photomask comprises a transparent substrate support member having at least a first and second surface, wherein said first surface is smooth and said second surface is patterned with a plurality of grooves; a film coating disposed over said plurality of groves, wherein said film coating has one or more openings.

Abstract: A method of level assist feature OPC layout is described using frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero diffraction energy can be determined. By determining isofocal intensity threshold requirements of an imaging process, a mask equalizing function can be designed. This provides the basis for frequency model-based assist feature layout. By choosing assist feature parameters that meet the requirements of the equalizing function, through-pitch focus and dose matching is possible for large two dimensional mask fields. The concepts introduced also lead to additional assist feature options and design flexibility.

Abstract: Reduction Talbot interference imaging is carried out using a glass or fused silica prism, where at least two surfaces within the prism allow for an increase in the propagating ray angles at the image plane compared to the object (the photomask) plane. Furthermore, by adding a second orthogonal pair of surfaces, X and Y order recombination is made possible thus allowing for the imaging in an orthogonal direction with a two-order interference scheme as well as repeating checkerboard (island and hole) patterns with a four-order interference scheme. A benefit of the invention is the reduced requirements of the photo mask, allowing for diffraction limited imaging with UV wavelengths in a media with index of unity (air) or larger (an immersion fluid). The prism interferometer is known as a Smith-Talbot prism lens.

Abstract: Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging a photoresist film with the system. The test target comprises at least one open figure which comprises a multiple component array of phase zones, where the multiple zones are arranged within the open figure so that their response to lens aberration is interrelated and the zones respond uniquely to specific aberrations depending on their location within the figure. The method detects aberration types including coma, spherical, astigmatism, and three-point through the exposure of a photoresist material placed in the image plane of the system and the evaluation of these images.

Abstract: A microlithograpic tool, such as a projection stepper, for manufacturing integrated circuits, shapes light that illuminates a photomask with a chevron illumination system. The system uses either a chevron aperture mask of diffractive optical elements to shape a light source into four chevrons (110b, 120b, 130b, 140b). The chevrons are located in the corners of the circular pupil of the condenser lens. The chevrons may be a small a square poles at the corners or as large as an annular square ring. The chevrons provide superior performance for illuminating conventional X and Y oriented features of a photomask.

Abstract: A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical proximity correction feature disposed between two of the resolvable features to be printed, where the non-resolvable optical proximity correction feature has a transmission coefficient in the range of greater than 0% to less than 100%.

Abstract: A photolithography mask for optically transferring a pattern formed in said mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, where each of the plurality of resolvable features has a longitudinal axis extending in a first direction; and a pair of non-resolvable optical proximity correction features disposed between two of the plurality of resolvable features, where the pair of non-resolvable optical proximity correction features has a longitudinal axis extending in a second direction, wherein the first direction of the longitudinal axis of the plurality of resolvable features is orthogonal to the second direction of the longitudinal axis of the pair of non-resolvable optical proximity correction features.

Abstract: A mask for use on a layer of imaging material which is located on at least a portion of one surface of a substrate in a lithography process in accordance with one embodiment of the present invention includes a layer of a masking material which has an optical density of at least 4.0 for wavelengths at or below about 180 nm and a thickness of less than about 1000 angstroms. Materials, such as tungsten and amorphous silicon, can be used for the mask.

Abstract: An illumination system for a microlithographic stepper has a light source that emits light of selected wavelength(s) along an optical path toward a photomask. An aperture mask is positioned in the path of the illumination light and between the light source and the photomask. The aperture mask has a dithered pattern of pixels. The intensity of the pattern controls the illumination of the photomask. The masking aperture pattern defines one or more zones of illumination. Each zone has elements that are patterned in accordance with a selected wavelength of incident light to diffract the incident light into an illumination pattern for illuminating a photomask. Each of the elements is constructed with a matrix of pixels. In the preferred embodiment the array of pixels is 8×8. The number of elements is generally greater than 3×3.