Patents by Inventor Bruce Walter Porth

Bruce Walter Porth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8881072
    Abstract: A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: November 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Santo Credendino, Michael D. Hulvey, Jothimalar Kuppusamy, Robert Kenneth Leidy, Paul William Pastel, Bruce Walter Porth, Anthony K. Stamper
  • Patent number: 8458628
    Abstract: A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: June 4, 2013
    Assignee: International Business Machines Corporation
    Inventors: Santo Credendino, Michael D. Hulvey, Jothimalar Kuppusamy, Robert Kenneth Leidy, Paul William Pastel, Bruce Walter Porth, Anthony K. Stamper
  • Publication number: 20120174046
    Abstract: A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
    Type: Application
    Filed: March 6, 2012
    Publication date: July 5, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Santo Credendino, Michael D. Hulvey, Jothimalar Kuppusamy, Robert Kenneth Leidy, Paul William Pastel, Bruce Walter Porth, Anthony K. Stamper
  • Patent number: 8176446
    Abstract: A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: May 8, 2012
    Assignee: International Business Machines Corporation
    Inventors: Santo Credendino, Michael D. Hulvey, Jothimalar Kuppusamy, Robert Kenneth Leidy, Paul William Pastel, Bruce Walter Porth, Anthony K. Stamper
  • Publication number: 20100064273
    Abstract: A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
    Type: Application
    Filed: September 11, 2008
    Publication date: March 11, 2010
    Inventors: Santo Credendino, Michael D. Hulvey, Jothimalar Kuppusamy, Robert Kenneth Leidy, Paul William Pastel, Bruce Walter Porth, Anthony K. Stamper