Patents by Inventor Bruno A. R. Vrebos

Bruno A. R. Vrebos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9739730
    Abstract: Apparatus includes an X-ray source 10, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detector 14 again for measuring X-ray fluorescence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.
    Type: Grant
    Filed: March 4, 2015
    Date of Patent: August 22, 2017
    Assignee: PANALYTICAL B.V.
    Inventors: Petronella Emerentiana Hegeman, Gustaaf Christian Brons, Aleksandr Komelkov, Bruno A. R. Vrebos, Waltherus Van Den Hoogenhof, Charalampos Zarkadas
  • Publication number: 20160258892
    Abstract: Apparatus includes an X-ray source 10, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detector 14 again for measuring X-ray fluoresence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.
    Type: Application
    Filed: March 4, 2015
    Publication date: September 8, 2016
    Inventors: Petronella Emerentiana Hegeman, Gustaaf Christian Brons, Aleksandr Komelkov, Bruno A.R. Vrebos, Waltherus Van Den Hoogenhof, Charalampos Zarkadas
  • Patent number: 7042978
    Abstract: A device (1; 1a) for the examination of at least one material sample (3; 3a, 3b, 3c) which can be inserted into the device (1; 1a) and is irradiated by means of electromagnetic waves (4), notably X-rays; in the measuring position the material sample (3; 3a, 3b, 3c) can be subjected to irradiation by means of the electromagnetic waves (4) and during a change of sample the beam path (4) can be interrupted by means of a closure element (8) which can be moved into the beam path. The device is constructed in such a manner that the closure element (8) is provided with a reference sample (9) on its side which faces the rays (4) in a manner such that a reference measurement can be performed thereon during a change of sample.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: May 9, 2006
    Assignee: Panalytical B.V.
    Inventors: Roelof De Lange, Bruno A. R. Vrebos
  • Publication number: 20040234029
    Abstract: A device (1; 1a) for the examination of at least one material sample (3; 3a, 3b, 3c) which can be inserted into the device (1; 1a) and is irradiated by means of electromagnetic waves (4), notably X-rays; in the measuring position the material sample (3; 3a, 3b, 3c) can be subjected to irradiation by means of the electromagnetic waves (4) and during a change of sample the beam path (4) can be interrupted by means of a closure element (8) which can be moved into the beam path. The device is constructed in such a manner that the closure element (8) is provided with a reference sample (9) on its side which faces the rays (4) in a manner such that a reference measurement can be performed thereon during a change of sample.
    Type: Application
    Filed: June 8, 2004
    Publication date: November 25, 2004
    Inventors: Roelof De Lange, Bruno A.R. Vrebos
  • Patent number: 5745543
    Abstract: In the case of simultaneous diffraction and fluorescence measurements in an apparatus for X-ray analysis comprising only one X-ray tube, a problem is encountered in that due to the presence of the collimators required for the fluorescence measurements only a very low X-ray power reaches the detectors, so that very long measuring times and/or an unfavorable signal-to-noise ratio occur. As a result, the detection limit for given measurements (low concentration of an element and/or light elements to be detected) becomes too high or the use of a (large and expensive) high-power X-ray tube is required. The invention utilizes a line focus tube 10 in combination with a single-slit collimator 14 for irradiating the sample 2, the fluorescence section 40 being constructed so as to have a plane or cylindrical analysis crystal 42 in combination with a location-sensitive detector 44. The diffraction measurements are performed by means of a conventional diffraction arrangement 24.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: April 28, 1998
    Assignee: U.S. Philips Corporation
    Inventors: Pieter K. De Bokx, Paul Van Der Sluis, Bruno A. R. Vrebos