Patents by Inventor Bruno Alexander Korngold

Bruno Alexander Korngold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8702999
    Abstract: Method and plasma treatment apparatus for treatment of a substrate surface (1) using an atmospheric pressure plasma. An atmospheric pressure plasma is provided in a treatment space (5) between a first electrode (2) and a second electrode (3). Furthermore, a substrate (1) and a mask web (7) in contact with the substrate (1) are provided. A plasma generating power is applied to the first and second electrode (2, 3) for treatment of surface areas of the substrate (1) exposed by the mask web (7), in which the substrate (1) and mask web (7) are moved synchronously through the treatment space (5).
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: April 22, 2014
    Assignee: FujiFilm Manufacturing Europe B.V.
    Inventors: Bruno Alexander Korngold, Hindrik Willem de Vries, Eugen Aldea
  • Patent number: 8609203
    Abstract: A method and apparatus for treatment of a substrate surface using an atmospheric pressure plasma is disclosed. The method comprises providing an atmospheric pressure plasma in a treatment space between a first electrode and a second electrode, providing a substrate in contact with the first electrode in the treatment space, and applying a plasma generating power to the first and second electrodes. The first electrode has a predefined structure of insulating areas and conductive areas for plasma treatment of surface areas of the substrate corresponding to the areas in contact with the conductive areas of the first electrode.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: December 17, 2013
    Assignee: Fujifilm Manufacturing Europe B.V.
    Inventors: Bruno Alexander Korngold, Hindrik Willem De Vries, Eugen Aldea
  • Patent number: 8338307
    Abstract: Plasma treatment apparatus and method for treatment of a surface of a substrate. A dielectric barrier discharge electrode structure is provided having a treatment space (5) and comprising a first electrode (2) and a second electrode (3), and a power supply (11) connected to the first electrode (2) and the second electrode (3) for generating an atmospheric pressure plasma in the treatment space (5). The plasma treatment apparatus further comprises a magnetic layer (6) provided on a surface of at least the first electrode (2). The first electrode (2) is arranged to receive, in operation, the substrate (1) to be treated and a mask device (7) in contact with the substrate (1), the mask device (7) interacting with the magnetic layer (6).
    Type: Grant
    Filed: February 1, 2008
    Date of Patent: December 25, 2012
    Assignee: Fujifilm Manufacturing Europe B.V.
    Inventors: Hindrik Willem De Vries, Bruno Alexander Korngold
  • Publication number: 20110089142
    Abstract: Method and apparatus for treatment of a substrate surface (1) using an atmospheric pressure plasma. The method comprises providing an atmospheric pressure plasma in a treatment space (5) between a first electrode (2) and a second electrode (3), providing a substrate (1) in contact with the first electrode (2) in the treatment space (5), and applying a plasma generating power to the first and second electrode (2, 3). The first electrode (2) has a predefined structure of insulating areas (7) and conductive areas (8) for plasma treatment of surface areas of the substrate (1) corresponding to the areas in contact with the conductive areas (8) of the first electrode (2).
    Type: Application
    Filed: February 19, 2009
    Publication date: April 21, 2011
    Inventors: Bruno Alexander Korngold, Hindrik Willem De Vries, Eugen Aldea
  • Publication number: 20110042347
    Abstract: Method and plasma treatment apparatus for treatment of a substrate surface (1) using an atmospheric pressure plasma. An atmospheric pressure plasma is provided in a treatment space (5) between a first electrode (2) and a second electrode (3). Furthermore, a substrate (1) and a mask web (7) in contact with the substrate (1) are provided. A plasma generating power is applied to the first and second electrode (2, 3) for treatment of surface areas of the substrate (1) exposed by the mask web (7), in which the substrate (1) and mask web (7) are moved synchronously through the treatment space (5).
    Type: Application
    Filed: January 29, 2009
    Publication date: February 24, 2011
    Applicant: Fujifilm Manufacturing Europe B.V.
    Inventors: Bruno Alexander Korngold, Hindrik Willem De Vries, Eugen Aldea
  • Publication number: 20100147794
    Abstract: Plasma treatment apparatus and method for treatment of a surface of a substrate. A dielectric barrier discharge electrode structure is provided having a treatment space (5) and comprising a first electrode (2) and a second electrode (3), and a power supply (11) connected to the first electrode (2) and the second electrode (3) for generating an atmospheric pressure plasma in the treatment space (5). The plasma treatment apparatus further comprises a magnetic layer (6) provided on a surface of at least the first electrode (2). The first electrode (2) is arranged to receive, in operation, the substrate (1) to be treated and a mask device (7) in contact with the substrate (1), the mask device (7) interacting with the magnetic layer (6).
    Type: Application
    Filed: February 1, 2008
    Publication date: June 17, 2010
    Inventors: Hindrik Willem De Vries, Bruno Alexander Korngold
  • Patent number: 6814514
    Abstract: A method of measuring a down-web coordinate is provided. A time-interval, elapsed since a detection of a position-indicating mark applied on a web, is related to a measured velocity. Upon detection of a position-indicating mark, the measured down-web coordinate is synchronised with the indicated down-web coordinate of said mark. The down-web coordinate can be measured in an ascending or a descending mode, depending on a detected roll-orientation information originated from said mark on said web. A selected lane pattern used for registration of the cross web position can be reversed automatically, depending on said roll-orientation information, originated from said mark on said web. A measured down-web starting position of a quality problem area on the web is marked by an ISO-hole.
    Type: Grant
    Filed: August 3, 2001
    Date of Patent: November 9, 2004
    Assignee: Fuji Photo Film B.V.
    Inventors: Bruno Alexander Korngold, Antonius Jozef van Hooff, Robert Hendrik Johan Sandifort, Josephus Nicolaas Petrus Verhoeven
  • Publication number: 20020030704
    Abstract: A method of measuring a down-web coordinate is provided. A time-interval, elapsed since a detection of a position-indicating mark applied on a web, is related to a measured velocity. Upon detection of a position-indicating mark, the measured down-web coordinate is synchronised with the indicated down-web coordinate of said mark. The down-web coordinate can be measured in an ascending or a descending mode, depending on a detected roll-orientation information originated from said mark on said web. A selected lane pattern used for registration of the cross web position can be reversed automatically, depending on said roll-orientation information, originated from said mark on said web. A measured down-web starting position of a quality problem area on the web is marked by an ISO-hole.
    Type: Application
    Filed: August 3, 2001
    Publication date: March 14, 2002
    Inventors: Bruno Alexander Korngold, Antonius Jozef van Hooff, Robert Hendrik Johan Sandifort, Josephus Nicolaas Petrus Verhoeven