Abstract: A system for manufacturing waterproofing membranes, including: a laminating machine; a textile belt moveable through the laminating machine; and a pair of edge strips positioned adjacent to opposite sides of the textile belt. A first polymer is unrolled onto the textile belt and positioned between a pair of edge strips positioned adjacent to opposite sides of the textile belt and then moved through the laminating machine to heat and cure the first polymer into a first waterproofing membrane. The edge strips are preferably endless loops of material that pass continuously through the laminating machine. A second polymer can also be unrolled onto an opposite side of the textile belt such that two different waterproofing membranes can be manufactured simultaneously.

Abstract: An electrode-less discharge source of extreme ultraviolet (EUV) radiation (10) efficiently assembles a hot, dense, uniform, axially stable plasma column (5) with magnetic pressure and inductive current drive. It employs theta-pinch-type magnetic compression of plasma confined in a magnetic mirror. Plasma, confined in a magnetic mirror, is made to radiate by resonant magnetic compression. The device comprises a radiation-source gas input nozzle (1), an optional buffer-gas input flow (2), mirror-field coils (9a, 9b), theta-pinch coils (8a, 8b), a plasma and debris dump (11), and an evacuation port (7). The circular currents yield an axially stable plasma-magnetic-field geometry, and a reproducible, stable, highly symmetrical EUV source.

Abstract: An electrode-less discharge source of extreme ultraviolet (EUV) radiation (10) efficiently assembles a hot, dense, uniform, axially stable plasma column (5) with magnetic pressure and inductive current drive. It employs theta-pinch-type magnetic compression of plasma confined in a magnetic mirror. Plasma, confined in a magnetic mirror, is made to radiate by resonant magnetic compression. The device comprises a radiation-source gas input nozzle (1), an optional buffer-gas input flow (2), mirror-field coils (9a, 9b), theta-pinch coils (8a, 8b), a plasma and debris dump (11), and an evacuation port (7). The circular currents yield an axially stable plasma-magnetic-field geometry, and a reproducible, stable, highly symmetrical EUV source.