Abstract: The present invention relates to a process, reactor and system to produce self-standing two-dimensional nanostructures, using a microwave-excited plasma environment. The process is based on injecting, into a reactor, a mixture of gases and precursors in stream regime. The stream is subjected to a surface wave electric field, excited by the use of microwave power which is introduced into a field applicator, generating high energy density plasmas, that break the precursors into its atomic and/or molecular constituents. The system comprises a plasma reactor with a surface wave launching zone, a transient zone with a progressively increasing cross-sectional area, and a nucleation zone. The plasma reactor together with an infrared radiation source provides a controlled adjustment of the spatial gradients, of the temperature and the gas stream velocity.

Abstract: The present invention relates to a process, reactor and system to produce self-standing two-dimensional nanostructures, using a microwave-excited plasma environment. The process is based on injecting, into a reactor, a mixture of gases and precursors in stream regime. The stream is subjected to a surface wave electric field, excited by the use of microwave power which is introduced into a field applicator, generating high energy density plasmas, that break the precursors into its atomic and/or molecular constituents. The system comprises a plasma reactor with a surface wave launching zone, a transient zone with a progressively increasing cross-sectional area, and a nucleation zone. The plasma reactor together with an infrared radiation source provides a controlled adjustment of the spatial gradients, of the temperature and the gas stream velocity.