Abstract: A compound of formula (I) wherein R1 and R2 independently of one another are hydrogen, C1-C22alkyl, —O—, —OH, —CH2CN, C1-C18alkoxy, C2-C18alkoxy substituted by —OH; C5-C12cycloalkoxy, C3-C6alkenyl, C3-C6alkenyloxy, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; and R3 and R4 independently of one another are C1-C22alkyl or a group of the formula (Ia) wherein R0 has one of the meanings of R1 and R2.

Abstract: A compound of formula (I) wherein R1 and R2 independently of one another are hydrogen, C1-C22alkyl, —O—, —OH, —CH2CN, C1-C18alkoxy, C2-C18alkoxy substituted by —OH; C5-C12cycloalkoxy, C3-C6alkenyl, C3-C6alkenyloxy, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; and R3 and R4 independently of one another are C1-C22alkyl or a group of the formula (Ia) wherein R0 has one of the meanings of R1 and R2.

Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula I-P, I-O or I-M Further embodiments are a compound of formula I-P, I-O or I-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.

Abstract: A composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation; and b) a compound of formula I (Formula I) (I) where R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 are independently from each other H, C1-C8-alkyl, C4-C8-cycloalkyl, phenyl, C1-C4-alkoxy or halogen; n is 1, 2, 3, or 4; and when n is 1 A is —C(=0)-OR?1, —C(=0)-N(R?2)(R?3), —CN, phenyl, which is unsubstituted or substituted by one or more C1-C8-alkyl, C4-C8-alkoxy, C5-C7-cycloalkyl or halogen, —H or —S02-phenyl; when n is 2 A is —C(=0)-0-Z1—O—C(=0)-, —C(=0)-N(R?1)—Z2—N(R?2)—C(=0)- or piperazine-N,N?-biscarbonyl.

Abstract: A compound of formula (I) wherein R1 and R2 independently of one another are hydrogen, C1-C22alkyl, —O—, —OH, —CH2CN, C1-C18alkoxy, C2-C18alkoxy substituted by —OH; C5-C12cycloalkoxy, C3-C6alkenyl, C3-C6alkenyloxy, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; and R3 and R4 independently of one another are C1-C22alkyl or a group of the formula (Ia) wherein R0 has one of the meanings of R1 and R2.

Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula I-P, I-O or I-M. Further embodiments are a compound of formula I-P, I-O or I-M, a process for protection of the organic material by the compound, the use of the compound against degradation of the organic material, an additive composition comprising the compound, a process for manufacturing the compound and an intermediate involved therein.

Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula I-P, I-O or I-M Further embodiments are a compound of formula I-P, I-O or I-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.

Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula 1-P, 1-O or I-M. Further embodiments are a compound of formula 1-P, 1-O or 1-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.

Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula I-P, I-O or I-M. Further embodiments are a compound of formula I-P, I-O or I-M, a process for protection of the organic material by the compound, the use of the compound against degradation of the organic material, an additive composition comprising the compound, a process for manufacturing the compound and an intermediate involved therein.

Abstract: The invention relates to a composition comprising an organic material susceptible to oxidative, thermal or light-induced degradation and a compound of formula 1-P, 1-O or I-M. Further embodiments are a compound of formula 1-P, 1-O or 1-M, a process for protection of the organic material by the compound, the use of the compound for stabilizing the organic material, an additive composition comprising the compound, a process for manufacturing the compound and intermediates involved therein.

Abstract: A composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation; and b) a compound of formula I (Formula I) (I) where R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 are independently from each other H, C1-C8-alkyl, C4-C8-cycloalkyl, phenyl, C1-C4-alkoxy or halogen; n is 1, 2, 3, or 4; and when n is 1 A is —C(=0)-OR?1, —C(=0)-N(R?2)(R?3), —CN, phenyl, which is unsubstituted or substituted by one or more C1-C8-alkyl, C4-C8-alkoxy, C5-C7-cycloalkyl or halogen, —H or —S02-phenyl; when n is 2 A is —C(=0)-0-Z1—O—C(=0)-, —C(=0)-N(R?1)—Z2—N(R?2)—C(=0)- or piperazine-N,N?-biscarbonyl.

Abstract: A composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation; and b) a compound of formula I (Formula I) (I) wherein R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 are independently from each other H, C1-C8-alkyl, C4-C8-cycloalkyl, phenyl, C1-C4-alkoxy or halogen; n is 1, 2, 3, or 4; and when n is 1 A is —C(=0)-OR?1, —C(=0)-N(R?2)(R?3), —CN, phenyl, which is unsubstituted or substituted by one or more C1-C8-alkyl, C4-C8-alkoxy, C5-C7-cycloalkyl or halogen, —H or —S02-phenyl; when n is 2 A is —C(=0)-O—Z1—O—C(=0)-, —C(=0)-N(R?1)—Z2—N(R?2)—C(=0)- or piperazine-N,N?-biscarbonyl.

Abstract: A compound of the formula (I), wherein R1 and R2 independently of one another are hydrogen, C1-C22alkyl, —O., —OH, —CH2CN, C1-C18alkoxy, C2-C18alkoxy substituted by —OH; C5-C12cycloalkoxy, C3-C6alkenyl, C3-C6alkenyloxy, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; and R3 and R4 independently of one another are C1-C22alkyl or a group of the formula (1a), wherein R0 has one of the meanings of R1 and R2.

Abstract: The present application relates to compositions comprising at least one acrylamide polymer P and at least one stabilizer S selected from sterically hindered amines; more particularly, the composition may be an aqueous solution comprising at least one acrylamide polymer P and at least one stabilizer S. In addition, the present invention relates to a process for producing the composition and to the use thereof in mineral oil production.

Abstract: The invention relates to a compound of the formula (I-1) wherein n is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24 or 25, R1, R2, R3, R4, R5, R?1, R?2, R?3, R?4 and R?5 are each independently from each other H or C1-C8-alkyl. Compounds of the formula (I-1) or stabilizer mixtures containing compounds of the formula (I-1) are especially used for stabilization of polymers against degradation by oxidation, heat or light.

Abstract: The present invention relates to a composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation, which is a polymer, an oligohydroxy compound, a wax, a fat or a mineral oil, with the proviso that the polymer is not a polypeptide, agar-agar or a component of agar-agar and the oligohydroxy compound is not glucose or a component of agar-agar; and b) a compound of formula (I) n is 1, 2, 3 or 4; when n is 1, R5 is H, C1-C30-alkyl, C3-C10-cycloalkyl, C6-C10-aryl, which is unsubstituted or substituted by C1-C8-alkyl, C1-C8-alkoxy, halogen or one phenyl, C7-C13-aralkyl, C2-C22-alkenyl, C3-C12-alkinyl, OH, C1-C30-alkyloxy, C3-C10-cycloalkyloxy, C6-C12-aryloxy, C7-C13-aralkyloxy, hydroxy-C1-C8-alkyl, carboxy-C1-C12-alkyl, C1-C12-alkoxycarbonyl-C1-C12-alkyl, C2-C30-alkyl, which is interrupted by one or more oxygen atoms, C2-C16-alkyl, which is interrupted by one sulfur atom, or NR?1R?2; when n is 2, R5 is C1-C12-alkane-diyl, C6-C14-arylene, C4-C8-cycloalkane-bis-(C1-

Abstract: The invention relates to a compound of the formula (I-1) wherein n is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24 or 25, R1, R2, R3, R4, R5, R?1, R?2, R?3, R?4, and R?5 are each independently from each other H or C1-C8-alkyl. Compounds of the formula (I-1) or stabilizer mixtures containing compounds of the formula (I-1) are especially used for stabilization of polymers against degradation by oxidation, heat or light.

Abstract: The present invention relates to methods of improving the scratch resistance of plastics materials and products made from them, such as articles in the automotive industry e.g. for the interior of automobiles, as well as the use of certain additives for that purpose and related invention embodiments. The improving comprises adding a friction modifier, and in addition a grafted polymer and a fatty acid amide, to a rubber modified polyolefin composition used as polymer substrate for the articles.

Abstract: The invention describes a process for stabilizing an organic material against oxidative, thermal or light-induced degradation, which comprises incorporating therein or applying thereto at least a compound of the formula (I) wherein the general symbols are as defined in claim 1. The compounds of the formula I are especially useful as processing stabilizers for synthetic polymers.

Abstract: The present invention relates to a composition, which comprises a) an organic material susceptible to oxidative, thermal or light-induced degradation, which is a polymer, an oligohydroxy compound, a wax, a fat or a mineral oil, with the proviso that the polymer is not a polypeptide, agar-agar or a component of agar-agar and the oligohydroxy compound is not glucose or a component of agar-agar; and b) a compound of formula (I) n is 1, 2, 3 or 4; when n is 1, R5 is H, C1-C30-alkyl, C3-C10-cycloalkyl, C6-C10-aryl, which is unsubstituted or substituted by C1-C8-alkyl, C1-C8-alkoxy, halogen or one phenyl, C7-C13-aralkyl, C2-C22-alkenyl, C3-C12-alkinyl, OH, C1-C30-alkyloxy, C3-C10-cycloalkyloxy, C6-C12-aryloxy, C7-C13-aralkyloxy, hydroxy-C1-C8-alkyl, carboxy-C1-C12-alkyl, C1-C12-alkoxycarbonyl-C1-C12-alkyl, C2-C30-alkyl, which is interrupted by one or more oxygen atoms, C2-C16-alkyl, which is interrupted by one sulfur atom, or NR?1R?2; when n is 2, R5 is C1-C12-alkane-diyl, C6-C14-arylene, C4-C8-cycloalkane-bis-(C1-