Patents by Inventor Bryan C. Rigg

Bryan C. Rigg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography process
    Patent number: 4514489
    Abstract: An improved photolithography process is disclosed wherein photoresist masks are treated to reduce the sticking of photoresist to the mask. In many photolithography processes, a photoresist layer is exposed through a photoresist mask having an opaque patterned layer on a surface of the mask. To prevent adhesion of the photoresist to the mask surface when the mask and photoresist are brought into contact, the mask surface is first treated in a fluorine plasma.
    Type: Grant
    Filed: September 1, 1983
    Date of Patent: April 30, 1985
    Assignee: Motorola, Inc.
    Inventors: Carlos N. Garcia, Bryan C. Rigg, Sally A. Tanner