Abstract: The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO2Cl2.

Abstract: The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO2Cl2.

Abstract: The present invention is directed to a pump arrangement for use in a gear box housing. The interior surface of the gear box housing has a collection wall arranged in the interior surface of the housing. A shaft is rotatably disposed through the gear box housing and has a longitudinal bore extending through the shaft that provides a lubrication delivery arrangement for distributing lubricant through the gear box housing. A pump housing circumscribes the shaft and has a discharge cavity connected to the longitudinal bore. Additionally, the pump housing has an inlet port for receiving lubrication from the collection wall. Contained within the pump housing is a pump member that has an impeller face and helical threaded surface that pressurizes and introduces the lubricant into the lubricant delivery arrangement.