Patents by Inventor Bryan D. Moran

Bryan D. Moran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12649284
    Abstract: Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system.
    Type: Grant
    Filed: May 2, 2024
    Date of Patent: June 9, 2026
    Assignee: 3D Systems, Inc.
    Inventors: Bryan D. Moran, Brian J. Bauman, Matthew Kenneth Gelber, Jordan Miller
  • Patent number: 12545766
    Abstract: In one embodiment, a mixture includes a polyfunctional monomer having at least one functional group amenable to polymerization, a porogen, and a polymerization initiator. In another embodiment, a product includes a porous three-dimensional structure formed by additive manufacturing, where the porous three-dimensional structure has ligaments arranged in a geometric pattern, the ligaments defining pores therebetween. The pores have an average diameter greater than about 10 microns, where an average length scale of the ligaments is greater than 100 nanometers. The ligaments are nanoporous, where at least 80% of a volume measured according to outer dimensions of the porous three-dimensional structure corresponds to the pores.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: February 10, 2026
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Siwei Liang, Theodore F. Baumann, Juergen Biener, Monika M. Biener, Bryan D. Moran, James Oakdale, Jianchao Ye
  • Patent number: 12420477
    Abstract: A large area projection micro stereolithography (LAP?SL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dimensional components with micro scale features.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: September 23, 2025
    Assignee: Lawrence Livermore National Security, LLC
    Inventor: Bryan D. Moran
  • Patent number: 12397506
    Abstract: The present disclosure relates to a system for performing scanning projection stereolithography. The system uses a light projector which is configured to generate a polymerizing optical signal to initiate polymerization of a photopolymerizable resin or material at a build plane. An optics subsystem collimates and focuses the polymerizing optical signal. The optics subsystem is movable relative to the build plane to optimize focus of the polymerizing optical signal at the build plane. A light scanning subsystem directs the polymerizing optical signal received from the optics subsystem to selected X axis and Y axis locations on the build plane. A positioning subsystem positions the optics subsystem at a selected location relative to the build plane, where the selected location is chosen to optimize focusing of the polymerizing optical signal at a specific, selected X/Y location on the build plane.
    Type: Grant
    Filed: April 26, 2022
    Date of Patent: August 26, 2025
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Bryan D. Moran, Brian J. Bauman
  • Patent number: 12157275
    Abstract: Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system.
    Type: Grant
    Filed: April 26, 2022
    Date of Patent: December 3, 2024
    Inventors: Bryan D. Moran, Brian J. Bauman, Matthew Kenneth Gelber, Jordan Miller
  • Publication number: 20240286361
    Abstract: Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system.
    Type: Application
    Filed: May 2, 2024
    Publication date: August 29, 2024
    Applicants: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC, 3D SYSTEMS, INC.
    Inventors: Bryan D. MORAN, Brian J. BAUMAN, Matthew Kenneth GELBER, Jordan MILLER
  • Patent number: 11919229
    Abstract: A large area projection micro stereolithography (LAPuSL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dimensional components with micro scale features.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: March 5, 2024
    Assignee: Lawrence Livermore National Security, LLC
    Inventor: Bryan D. Moran
  • Publication number: 20230415405
    Abstract: A product includes a three-dimensional structure having a plurality of sequentially-formed layers comprised of liquid crystal elastomers. The liquid crystal elastomers in a portion of a first of the layers are substantially aligned in a predefined first orientation and the liquid crystal elastomers in a portion of a second of the layers are substantially aligned in a predefined second orientation that is different than the first orientation. Each of the portions of the three-dimensional structure is characterized as exhibiting a shape change in response to a stimulus, wherein the shape change is reversible. The product includes a contiguous region of aligned liquid crystal elastomers in one of the portions having a maximum dimension of less than 60 microns.
    Type: Application
    Filed: August 24, 2023
    Publication date: December 28, 2023
    Applicant: Lawrence Livermore National Security, LLC
    Inventors: Bryan D. Moran, Elaine Lee, Caitlyn Christian Krikorian, Logan Bekker
  • Patent number: 11840018
    Abstract: The present disclosure relates to a method for forming a three dimensional (3D) component from a photopolymer resin. The method may involve generating a first optical beam at a first wavelength, with the first optical beam causing polymerization of a photopolymerizable resist. A second optical beam is generated at a second wavelength, different from the first wavelength, which inhibits polymerization of the photopolymerizable resist. A device is used to receive the first and second optical beams and to generate therefrom corresponding separate first and second light patterns, respectively, where the first light pattern forms a first image on the photopolymerizable resist to cause polymerization of a first portion of the photopolymerizable resist, while the second light pattern forms a second image on the photopolymerizable resist and inhibits polymerization of a second portion of the photopolymerizable resist.
    Type: Grant
    Filed: June 11, 2021
    Date of Patent: December 12, 2023
    Assignee: Lawrence Livermore National Security, LLC
    Inventor: Bryan D. Moran
  • Patent number: 11794406
    Abstract: A method of forming a three-dimensional structure of liquid crystal (LC) elastomers includes contacting a resin layer of LC oligomers with a layer of photoalignment material, and exposing a portion of photoalignment material to light for aligning the portion of photoalignment material in a first orientation. The LC oligomers adjacent the illuminated portion of photoalignment material align to the first orientation of the illuminated portion. The portion of aligned LC oligomers of the resin layer are cured. Operations for forming additional layers include creating a relative movement of the resin layer away from the photoalignment material, contacting another resin layer with the photoalignment material, and exposing another portion of photoalignment material to light for aligning the photoalignment material in a different orientation.
    Type: Grant
    Filed: June 23, 2022
    Date of Patent: October 24, 2023
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Bryan D. Moran, Elaine Lee, Caitlyn Christian Krikorian, Logan Bekker
  • Patent number: 11688596
    Abstract: The present disclosure relates to a lattice substrate adapted for use in direct ionization mass spectrometry. The substrate may have a plurality of tessellated unit cells forming an integral structure. Each tessellated unit cell may have a dimension of no more than about 1.5 mm and may include a plurality of pores arranged in an ordered pattern. The substrate may further include a form factor suitable for use with a direct ionization mass spectrometry system.
    Type: Grant
    Filed: February 12, 2021
    Date of Patent: June 27, 2023
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Maria C. Prieto Conaway, Joshua R. Deotte, Nikola Dudukovic, Eric B. Duoss, Bryan D. Moran
  • Publication number: 20220339877
    Abstract: The present disclosure relates to a system for performing scanning projection stereolithography. The system uses a light projector which is configured to generate a polymerizing optical signal to initiate polymerization of a photopolymerizable resin or material at a build plane. An optics subsystem collimates and focuses the polymerizing optical signal. The optics subsystem is movable relative to the build plane to optimize focus of the polymerizing optical signal at the build plane. A light scanning subsystem directs the polymerizing optical signal received from the optics subsystem to selected X axis and Y axis locations on the build plane. A positioning subsystem positions the optics subsystem at a selected location relative to the build plane, where the selected location is chosen to optimize focusing of the polymerizing optical signal at a specific, selected X/Y location on the build plane.
    Type: Application
    Filed: April 26, 2022
    Publication date: October 27, 2022
    Inventors: Bryan D. MORAN, Brian J. BAUMAN
  • Publication number: 20220339883
    Abstract: Provided herein is a system for producing a product. The system generally comprises a large-area micro-stereolithography system, an optical imaging system, and a controller in communication with the large-area micro-stereolithography system and the optical imaging system. The large-area micro-stereolithography system is capable of generating the product by optically polymerizing successive layers of a curable resin at a build plane. The controller is capable of analyzing a focus level of the reference target based on the captured image; and based on the analyzing, adjusting a focus property of the projected image beam of the stereolithography system.
    Type: Application
    Filed: April 26, 2022
    Publication date: October 27, 2022
    Inventors: Bryan D. MORAN, Brian J. BAUMAN, Matthew Kenneth GELBER, Jordan MILLER
  • Publication number: 20220262613
    Abstract: The present disclosure relates to a lattice substrate adapted for use in direct ionization mass spectrometry. The substrate may have a plurality of tessellated unit cells forming an integral structure. Each tessellated unit cell may have a dimension of no more than about 1.5 mm and may include a plurality of pores arranged in an ordered pattern. The substrate may further include a form factor suitable for use with a direct ionization mass spectrometry system.
    Type: Application
    Filed: February 12, 2021
    Publication date: August 18, 2022
    Inventors: Maria C. PRIETO CONAWAY, Joshua R. DEOTTE, Nikola DUDUKOVIC, Eric B. DUOSS, Bryan D. MORAN
  • Publication number: 20220111584
    Abstract: A large area projection micro stereolithography (LAPuSL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dimensional components with micro scale features.
    Type: Application
    Filed: November 22, 2021
    Publication date: April 14, 2022
    Inventor: Bryan D. Moran
  • Publication number: 20210339473
    Abstract: The present disclosure relates to a method for forming a three dimensional (3D) component from a photopolymer resin. The method may involve generating a first optical beam at a first wavelength, with the first optical beam causing polymerization of a photopolymerizable resist. A second optical beam is generated at a second wavelength, different from the first wavelength, which inhibits polymerization of the photopolymerizable resist. A device is used to receive the first and second optical beams and to generate therefrom corresponding separate first and second light patterns, respectively, where the first light pattern forms a first image on the photopolymerizable resist to cause polymerization of a first portion of the photopolymerizable resist, while the second light pattern forms a second image on the photopolymerizable resist and inhibits polymerization of a second portion of the photopolymerizable resist.
    Type: Application
    Filed: June 11, 2021
    Publication date: November 4, 2021
    Inventor: Bryan D. MORAN
  • Patent number: 11130288
    Abstract: The present disclosure relates to a digital light projector (DLP) system which has first and second light sources. The first optical source may generate a first beam at a first wavelength which causes polymerization of a photopolymerizable resist. The second optical source may generate a second beam at a second wavelength different from the first wavelength, and where the second beam inhibits polymerization of the photopolymerizable resist. A digital micromirror device (DMD) is included which has a plurality of micromirrors and is configured to be illuminated by the first and second beams and to generate a pattern on the micromirrors which has light from the first and second light wavelengths controlled by the micromirror position. The first light image causes polymerization of a first portion of the photopolymerizable resist, while the second image inhibits polymerization of a second portion of the photopolymerizable resist.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: September 28, 2021
    Assignee: Lawrence Livermore National Security, LLC
    Inventor: Bryan D. Moran
  • Patent number: 11072160
    Abstract: The present disclosure relates to a system for forming a three dimensional (3D) part. The system may incorporate a beam delivery subsystem for generating optical signals, and a mask subsystem that receives the optical signals and generates optical images therefrom. A first one of the optical images activates a polymerization species of a photo-sensitive resin in accordance with illuminated areas thereof, to thus cause polymerization of select portions of the photo-sensitive resin to help form a layer of the 3D part. A second one of the optical images causes stimulated emission depletion of subportions of the polymerization species, simultaneously, over various areas of the layer, to enhance resolution of at least one subportion of the select portions of the photo-sensitive resin.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: July 27, 2021
    Assignees: Lawrence Livermore National Security, LLC, The Regents Of The University Of California
    Inventors: Ryan Hensleigh, Bryan D. Moran, Julie A. Jackson, Eric Duoss, Brett Kelly, Maxim Shusteff, Hayden Taylor, Christopher Spadaccini
  • Publication number: 20200317870
    Abstract: In one embodiment, a mixture includes a polyfunctional monomer having at least one functional group amenable to polymerization, a porogen, and a polymerization initiator. In another embodiment, a product includes a porous three-dimensional structure formed by additive manufacturing, where the porous three-dimensional structure has ligaments arranged in a geometric pattern, the ligaments defining pores therebetween. The pores have an average diameter greater than about 10 microns, where an average length scale of the ligaments is greater than 100 nanometers. The ligaments are nanoporous, where at least 80% of a volume measured according to outer dimensions of the porous three-dimensional structure corresponds to the pores.
    Type: Application
    Filed: April 4, 2019
    Publication date: October 8, 2020
    Inventors: Siwei Liang, Theodore F. Baumann, Juergen Biener, Monika M. Biener, Bryan D. Moran, James Oakdale, Jianchao Ye
  • Patent number: 10647580
    Abstract: In one embodiment, a composition of matter includes: a plurality of ligaments each independently comprising one or more layers of graphene; where the plurality of ligaments are arranged according to a deterministic three-dimensional (3D) pattern. In another embodiment, a method of forming a deterministic three-dimensional (3D) architecture of graphene includes: forming or providing a substrate structurally characterized by a predefined 3D pattern; forming one or more layers of metal on surfaces of the substrate; and forming one or more layers of graphene on surfaces of the metal.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: May 12, 2020
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Jianchao Ye, Juergen Biener, Patrick Campbell, Wen Chen, Julie A. Jackson, Bryan D. Moran, James Oakdale, William Smith, Christopher Spadaccini, Marcus A. Worsley, Xiaoyu Zheng