Abstract: A freeform optical surface includes, in part, an off-axis optical surface and a departure optical module. The off-axis optical surface may be an off-axis conic optical surface. The departure optical module may be substantially perpendicular to the off-axis conic optical surface.

Abstract: A freeform optical surface includes, in part, an off-axis optical surface and a departure optical module. The off-axis optical surface may be an off-axis conic optical surface. The departure optical module may be substantially perpendicular to the off-axis conic optical surface.

Abstract: An optical design system generates a design state overview of a design of an optical system, the design state overview summarizing a current state and a target state of the design by describing a plurality of specifications for the optical system, the specification descriptions including target ranges for the specifications based on the target state of the design and further including current values for the specifications based on the current state of the design. The optical design system displays the design state overview. The optical design system updates the design state overview in response to the optical design system changing the current design for the optical system.

Abstract: The invention provides a method of making a <194 nm wavelength calcium fluoride crystal optical lithography element for transmitting wavelengths less than about 194 nm along an optical axis with minimal birefringence by providing an optical element optical calcium fluoride crystal with an input face {100} crystal plane and forming the input face {100} crystal plane into an optical lithography element surface of an optical lithography element having an optical axis, with the optical axis aligned with a <100> crystal direction of the optical calcium fluoride crystal. In a preferred embodiment, the below 194 nm transmitting optical element is a <100>oriented calcium fluoride lens. In a preferred embodiment, the below 194 nm transmitting optical element is a <100> oriented calcium fluoride beam splitter.

Abstract: The invention provides a method of making a <194 nm wavelength calcium fluoride crystal optical lithography element for transmitting wavelengths less than about 194 nm along an optical axis with minimal birefringence by providing an optical element optical calcium fluoride crystal with an input face {100} crystal plane and forming the input face {100} crystal plane into an optical lithography element surface of an optical lithography element having an optical axis, with the optical axis aligned with a <100> crystal direction of the optical calcium fluoride crystal. In a preferred embodiment, the below 194 nm transmitting optical element is a <100>oriented calcium fluoride lens. In a preferred embodiment, the below 194 nm transmitting optical element is a <100> oriented calcium fluoride beam splitter.

Abstract: A speckle reduction system divides pulses of coherent radiation into successions of temporally separated and spatially aberrated pulselets. One or more beamsplitters divide the pulses into the successions of pulselets that are circulated through delay lines. Spatial aberrators located along the delay lines modify wavefront shapes of the pulselets. Together, the temporal separation and spatial aberration of the pulselets produce a succession of different speckle patterns that can be averaged together within the integration interval of a detector to reduce speckle contrast.