Patents by Inventor Bryan G. Moosman
Bryan G. Moosman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8855166Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.Type: GrantFiled: January 17, 2012Date of Patent: October 7, 2014Assignee: Cymer, LLCInventors: Richard C. Ujazdowski, Richard M. Ness, J. Martin Algots, Vladimir B. Fleurov, Frederick A. Palenschat, Walter D. Gillespie, Bryan G. Moosman, Thomas D. Steiger, Brett D. Smith, Thomas E. McKelvey
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Publication number: 20120120974Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.Type: ApplicationFiled: January 17, 2012Publication date: May 17, 2012Inventors: Richard C. Ujazdowski, Richard M. Ness, J. Martin Algots, Vladimir B. Fleurov, Frederick A. Palenschat, Walter D. Gillespie, Bryan G. Moosman, Thomas D. Steiger, Brett D. Smith, Thomas E. McKelvey
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Patent number: 7995637Abstract: One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.Type: GrantFiled: October 21, 2009Date of Patent: August 9, 2011Assignee: Cymer, Inc.Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Bryan G. Moosman, Tae H. Chung, Thomas P. Duffey, James J. Ferrell, Terance Hilsabeck
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Publication number: 20100142582Abstract: One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.Type: ApplicationFiled: October 21, 2009Publication date: June 10, 2010Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Bryan G. Moosman, Tae H. Chung, Thomas P. Duffey, James J. Ferrell, Terance Hilsabeck
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Patent number: 7522650Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall.Type: GrantFiled: March 31, 2004Date of Patent: April 21, 2009Assignee: Cymer, Inc.Inventors: William N. Partlo, Yoshiho Amada, James A. Carmichael, Timothy S. Dyer, Walter D. Gillespie, Bryan G. Moosman, Richard G. Morton, Curtis L. Rettig, Brian D. Strate, Thomas D. Steiger, Fedor Trintchouk, Richard C. Ujazdowski
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Patent number: 7301980Abstract: A gas discharge laser includes a laser chamber containing a halogen laser gas, two electrode elements defining a cathode and an anode, each having a discharge receiving region defining two longitudinal edges and having a region width defining a width of an electric discharge between the electrode elements in the laser gas. The anode comprising a first anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region, a pair of second anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an electrode center base portion integral with the first anode portion; and wherein each of the respective pair of second anode portions is mechanically bonded to the center base portion.Type: GrantFiled: June 25, 2004Date of Patent: November 27, 2007Assignee: Cymer, Inc.Inventors: Thomas D. Steiger, Richard C. Ujazdowski, Timothy S. Dyer, Thomas P. Duffey, Walter D. Gillespie, Bryan G. Moosman, Richard G. Morton, Brian D. Strate
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Patent number: 7068697Abstract: A laser and method for operating a laser and disclosed. The laser may include a first discharge electrode and a second discharge electrode positioned at a distance from the first electrode. A laserable gas may be provided together with a circulation system to flow the gas into a space between the electrodes. A voltage source may be connected to the electrodes for creating a discharge in the space; and a flow guide having a guide surface in contact with the gas may be provided that is guide selectively moveable relative to the first electrode to guide a flow of gas into the space. In one implementation, the flow guide directs flow toward an extremity of the first electrode and is adjustable to direct flow toward the extremity as the first electrode wears.Type: GrantFiled: September 28, 2005Date of Patent: June 27, 2006Assignee: Cymer, Inc.Inventors: Yoshiho Amada, Richard G. Morton, Bryan G. Moosman