Abstract: An improved cleaning fluid supply housing assembly for a cascade-type substrate scrubber having a sliding piston configured with a flange with recesses so that the piston is out of contact with the rotating part of the brush core mandrel bearing assembly. Rather, the piston flange outer face only contacts the stationary outer race of the mandrel bearing. The water supply piston is also configured with a full bore to minimize the pressure on the end of the mandrel. A tolerance-controlled leak through the bearing is provided by the configuration of the piston flange to provide a flushing of the area in which wear might be a source of particle generation by a controlled tolerance leak upstream of the brushes. These features substantially eliminate the source of particle generation from contact wear and the contribution of such wear particles into the interface between the brush and the substrate surface being cleaned.

Abstract: Small form factor pallet assembly, comprising a slotted plate having at opposite ends a mandrel drive assembly and an idler assembly, each with end fittings for engaging the drive and manifold block of a cascade-type scrubber permits scrubbing of SFF substrates by replacement of LFF scrub brushes with the SFF pallet. The SFF pallet slot is oriented below its brush nip so SSF substrates can engage the LFF rotation belt and transport drive. The drive chain is fitted with multi-finger yokes of different sizes so that several sizes of SFF substrates can be scrubbed in the pallet with a single chain. Trolleys for lateral transport of substrates from the input zone to the scrubber lane and from it to the output bay are disclosed. The inventive SFF pallet system meets the changing needs of the hard drive industry, and its retrofit capacity extends the life of already-installed LFF cascade scrubbers.

Abstract: The present invention provides a lightweight structure for simultaneously providing a reduced infrared and radar Signature, while adding little or no weight to a vehicle. As such, the present invention allows for substantial improvements over prior systems. An example of the type of vehicle able to make use of the present invention is a military helicopter, but there is nothing within the spirit and scope of the present invention limiting it to any particular vehicle. The teachings of the present invention are useful with any vehicle for which a reduction in infrared emissions and microwave reflections is desired.

Abstract: An improved cleaning fluid supply housing assembly for a cascade-type substrate scrubber having a sliding piston configured with a flange with recesses so that the piston is out of contact with the rotating part of the brush core mandrel bearing assembly. Rather, the piston flange outer face only contacts the stationary outer race of the mandrel bearing. The water supply piston is also configured with a full bore to minimize the pressure on the end of the mandrel. A tolerance-controlled leak through the bearing is provided by the configuration of the piston flange to provide a flushing of the area in which wear might be a source of particle generation by a controlled tolerance leak upstream of the brushes. These features substantially eliminate the source of particle generation from contact wear and the contribution of such wear particles into the interface between the brush and the substrate surface being cleaned.

Abstract: A cascaded disk scrubbing system and method are provided. The cascaded disk scrubbing system includes an array of rows of brush pairs. Each row includes a plurality of counter-rotating brush pairs that are arranged horizontally and longitudinally, and configured to receive and process a disk in a vertical orientation through disk preparation zones defined by each pair of brushes. Below and between the pairs of brushes is a track that is configured to apply a rotation to the disk and to transition the disk in a vertical orientation through the brush pairs. Nozzles dispense fluids on and over the brush pairs, and the brush pairs are configured such that fluids are dispensed through the brush pairs. Nozzles dispense a curtain of fluid between each disk preparation zone, and the cascaded disk scrubbing system is configured to progress from dirtiest to cleanest as the disk transitions through each disk preparation zone.

Abstract: A cascaded wafer scrubbing system and method are provided. The cascaded wafer scrubbing system includes an array of rows of brush pairs. Each row includes a plurality of counter-rotating brush pairs that are arranged horizontally and longitudinally, and configured to receive and process a wafer in a vertical orientation through wafer preparation zones defined by each pair of brushes. Below and between the pairs of brushes is a track that is configured to apply a rotation to the wafer and to transition the wafer in a vertical orientation through the brush pairs. Nozzles dispense fluids on and over the brush pairs, and the brush pairs are configured such that fluids are dispensed through the brush pairs. Nozzles dispense a curtain of fluid between each wafer preparation zone, and the cascaded wafer scrubbing system is configured to progress from dirtiest to cleanest as the wafer transitions through each wafer preparation zone.