Abstract: An X-ray photoelectron spectroscopy analysis system for analysing an insulating sample 20, and a method of XPS analysis. The system comprises an X-ray generating means 30 having an exit opening 32 and being arranged to generate primary X-rays 46,56 which pass out of the exit opening in a sample direction towards a sample surface 22 for irradiation thereof. It has been found that the X-ray generating means in use additionally generates unwanted electrons 258 which may pass out of the exit opening substantially in the sample direction and cause undesirable sample charging effects. The system further comprises an electron deflection field generating means 380,480,580 arranged to generate a deflection field upstream of the sample surface. The deflection field is configured to deflect the unwanted electrons away from the sample direction, such that the unwanted electrons are prevented from reaching the sample surface.

Abstract: A spectrometer (10) for sample surface analysis by irradiation of the surface by primary particles and a corresponding method of surface analysis spectroscopy. The spectrometer (10) provides sample viewing and secondary charged particle collection substantially normal to the sample surface. A collection chamber (22) comprises a secondary charged particle lens arrangement (20) to focus the emitted particles in a downstream direction along a first normal axis (24) and thereby to define a charged particle optical crossover location (25); and a light-reflecting optical element (50) downstream of the lens arrangement and arranged to receive image light (41) and reflect it away from a second normal axis (42) for providing a viewable image of the surface.

Abstract: A spectrometer (10) for sample surface analysis by irradiation of the surface by primary particles and a corresponding method of surface analysis spectroscopy. The spectrometer (10) provides sample viewing and secondary charged particle collection substantially normal to the sample surface. A collection chamber (22) comprises a secondary charged particle lens arrangement (20) to focus the emitted particles in a downstream direction along a first normal axis (24) and thereby to define a charged particle optical crossover location (25); and a light-reflecting optical element (50) downstream of the lens arrangement and arranged to receive image light (41) and reflect it away from a second normal axis (42) for providing a viewable image of the surface.

Abstract: An X-ray photoelectron spectroscopy analysis system for analysing an insulating sample 20, and a method of XPS analysis. The system comprises an X-ray generating means 30 having an exit opening 32 and being arranged to generate primary X-rays 46,56 which pass out of the exit opening in a sample direction towards a sample surface 22 for irradiation thereof. It has been found that the X-ray generating means in use additionally generates unwanted electrons 258 which may pass out of the exit opening substantially in the sample direction and cause undesirable sample charging effects. The system further comprises an electron deflection field generating means 380,480,580 arranged to generate a deflection field upstream of the sample surface. The deflection field is configured to deflect the unwanted electrons away from the sample direction, such that the unwanted electrons are prevented from reaching the sample surface.

Abstract: A flood gun 10 for charge neutralization of an analysis region Ra of a sample S downstream of the flood gun, comprising: a first source 30 of electrons; a second source 50 of positively charged particles; and an extraction and focusing assembly 60,64, arranged to: (i) extract a first, electron beam from the first source and focus the first beam to a first flood area Ae at the analysis region; and (ii) extract a second, positive particle beam from the second source and focus the second beam to a second flood area Ai at the analysis region. The electron beam and the positive particle beam may both be extracted and focused simultaneously, in a single mode of operation or, alternately, in a dual mode of operation. A corresponding method of providing charge neutralization and a spectroscopic system for secondary particle emission analysis are disclosed.

Abstract: A spectroscopic analyser and method of use, for surface analysis spectroscopy, are disclosed. The spectroscopic analyser 10 has a time-of-flight (TOF) spectrometer which analyses secondary electrons emitted from a surface of a sample 30 on excitation by an irradiation source 40. The TOF spectrometer includes a gate 50, which receives and selectively passes a proportion of the secondary electrons by pulsed deflection or retardation of the electron beam using gating members 55. In that manner one or more pulses of electrons enter a magnetic field-free flight tube 90 and reach a detector 120 downstream of the gate 50. The flight times, and therefore energies, of the detected electrons through the flight tube 90 are thereby detected. A curved electron mirror 100 may be used to increase the flight path of the pulsed electrons in the flight tube 90, thereby increasing the spread of each electron pulse within the analyser 10.