Patents by Inventor Bryan Swain

Bryan Swain has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7591600
    Abstract: A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of the light sensitive material applied to the substrates has changed from a first batch of light sensitive material to a second batch light sensitive material. A change in photolithography process results caused by the change from the first batch to the second batch of light sensitive material is determined. Also included is initiating corrective action based on the change in photolithography process results.
    Type: Grant
    Filed: February 23, 2007
    Date of Patent: September 22, 2009
    Assignee: Tokyo Electron Limited
    Inventors: David Dixon, Bryan Swain
  • Publication number: 20080204734
    Abstract: A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of the light sensitive material applied to the substrates has changed from a first batch of light sensitive material to a second batch light sensitive material. A change in photolithography process results caused by the change from the first batch to the second batch of light sensitive material is determined. Also included is initiating corrective action based on the change in photolithography process results.
    Type: Application
    Filed: February 23, 2007
    Publication date: August 28, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: David Dixon, Bryan Swain