Patents by Inventor Bryant N. Zingerman

Bryant N. Zingerman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4350578
    Abstract: A cathode for reactive ion etching is provided which improves the etch rate and the uniformity of etching on the object etched. The cathode has a quartz plate with a series of recesses having disks therein of the same material as the object to be etched and a ring of that same material around the outer edge of the plate. In a preferred embodiment a cathode for etching silicon wafers has silicon disks recessed in a quartz plate at each wafer holding position and a ring of silicon around the outer edge of the plate.
    Type: Grant
    Filed: May 11, 1981
    Date of Patent: September 21, 1982
    Assignee: International Business Machines Corporation
    Inventors: Rudolf G. Frieser, William H. Ma, Gunars M. Ozols, Bryant N. Zingerman
  • Patent number: 4229247
    Abstract: Chromium is etched in a glow discharge without attack on Al/Cu, Si, SiO.sub.2, and Si.sub.3 N.sub.4 layers by etching in a low pressure ambient atmosphere containing a polychlorinated organic compound such as CCl.sub.4, water, and a material selected from the group consisting of the noble gases and oxygen.
    Type: Grant
    Filed: December 26, 1978
    Date of Patent: October 21, 1980
    Assignee: International Business Machines Corporation
    Inventors: George T. Chiu, James R. Kitcher, Gunars M. Ozols, Bryant N. Zingerman
  • Patent number: 4203800
    Abstract: Metal layers, for example; chromium and titanium-tungsten, used in conductive metallurgies as adhesion or barrier layers for integrated circuit devices which are formed in silicon semiconductor substrates, are selectively etched without significant attack on either the silicon substrate or aluminum conductor layers. The metal layers are exposed to a glow discharge formed by imposing an RF voltage across two spaced electrodes in an ambient atmosphere comprising a gaseous mixture of from about 5 to about 20 percent by volume of a polychlorinated organic compound containing one to two carbon atoms, for example, CCl.sub.4 or C.sub.2 HCl.sub.3 and about 80 to about 95 percent by volume of oxygen at a pressure in the range of about 5 to 50 milli-torr.
    Type: Grant
    Filed: April 2, 1979
    Date of Patent: May 20, 1980
    Assignee: International Business Machines Corporation
    Inventors: James R. Kitcher, Gunars M. Ozols, Bryant N. Zingerman