Patents by Inventor Bu-Dl Yoo

Bu-Dl Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for measuring semiconductor device
    Patent number: 8324571
    Abstract: An apparatus for measuring a semiconductor device is provided. The apparatus includes a beam emitter configured to irradiate an electron beam onto a sample having the entire region composed of a critical dimension (CD) region, which is formed by etching or development, and a normal region connected to the CD region, and an analyzer electrically connected to the beam emitter, and configured to select and set a wavelength range of a region in which a difference in reflectance between the CD region and the normal region occurs, after obtaining reflectance from the electron beam reflected by a surface of the sample according to the wavelength of the electron beam. A method of measuring a semiconductor device using the measuring apparatus is also provided.
    Type: Grant
    Filed: February 26, 2010
    Date of Patent: December 4, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young-Seok Kim, Jong-Sun Peak, Young-Nam Kim, Hyung-Suk Cho, Sun-Jin Kang, Bu-Dl Yoo
  • APPARATUS AND METHOD FOR MEASURING SEMICONDUCTOR DEVICE
    Publication number: 20100219340
    Abstract: An apparatus for measuring a semiconductor device is provided. The apparatus includes a beam emitter configured to irradiate an electron beam onto a sample having the entire region composed of a critical dimension (CD) region, which is formed by etching or development, and a normal region connected to the CD region, and an analyzer electrically connected to the beam emitter, and configured to select and set a wavelength range of a region in which a difference in reflectance between the CD region and the normal region occurs, after obtaining reflectance from the electron beam reflected by a surface of the sample according to the wavelength of the electron beam. A method of measuring a semiconductor device using the measuring apparatus is also provided.
    Type: Application
    Filed: February 26, 2010
    Publication date: September 2, 2010
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-Seok KIM, Jong-Sun PEAK, Young-Nam KIM, Hyung-Suk CHO, Sun-Jin KANG, Bu-Dl YOO